PIC: CMOS-compatible, monolithic, and high-performance optical isolators on silicon

PIC：CMOS 兼容、单片、高性能硅光隔离器

• 批准号: 2028199
• 负责人: Caroline Ross
• 金额: $ 50万
• 依托单位: Massachusetts Institute of Technology
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2020
• 资助国家: 美国
• 起止时间: 2020-09-01 至 2023-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2028199&HistoricalAwards=false
• 关键词: PIC; CMOS; compatible; monolithic; performance

Optical isolators are optical diodes which only allow uni-directional transmission of light. They constitute an essential component in chip-scale photonic circuits, although their integration with photonic chips has been challenging due to material and processing incompatibility. The program seeks to develop an isolator solution for chip-scale photonic circuits which can be manufactured leveraging standard semiconductor microfabrication processes offered by the American Institute for Manufacturing Integrated Photonics. Success of the project will have an immediate impact on fields such as optical communications, optical analog computing, and magnetooptical sensing. The scientific research will be tightly integrated with educational and outreach initiatives at MIT and the AIM Photonics Academy. We will also collaborate with the Lab for Education & Application Prototypes to develop both online interactive modules and hands-on experiments for K-12 students and workshop participants from academia, government, and industry around the globe. Technical: Optical isolators are essential optical components safeguarding the stable operation of lasers and photonic integrated circuits (PICs). None of the current approaches for on-chip optical isolation, however, meets the stringent demands for practical deployment of these devices in state-of-the-art PICs: high isolation ratio, minimal insertion loss, broadband operation, small footprint, passive operation, polarization diversity, as well as compatibility with scalable Si manufacturing. This program will lead to a transformative solution to this challenge by developing the first optical isolator on Si that fulfills all the aforementioned requirements. In addition to exploring device design and processing innovations to enable unprecedented high performance, the program will also validate scalable manufacturing and integration of the isolator device through prototyping at the American Institute for Manufacturing Integrated Photonics (AIM Photonics) leveraging standard Si manufacturing processes, followed by backend-compatible monolithic deposition of magnetooptical garnet materials. This multi-faceted approach will provide a practical solution to bridge the large performance gap between current on-chip isolators and the target for their deployment in PICs and solve a longstanding challenge facing the integrated photonics community.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

光隔离器是只允许光单向传输的光二极管。它们构成了芯片级光子电路的重要组成部分，尽管由于材料和工艺不兼容，它们与光子芯片的集成一直具有挑战性。该计划旨在开发一种用于芯片级光子电路的隔离器解决方案，该解决方案可以利用美国集成光子学制造研究所提供的标准半导体微加工工艺进行制造。该项目的成功将对光通信、光模拟计算、磁光传感等领域产生直接影响。科学研究将与麻省理工学院和 AIM 光子学院的教育和推广活动紧密结合。我们还将与教育和应用原型实验室合作，为来自全球学术界、政府和工业界的 K-12 学生和研讨会参与者开发在线互动模块和动手实验。技术：光隔离器是保障激光器和光子集成电路（PIC）稳定运行的重要光学器件。然而，目前的片上光隔离方法都无法满足在最先进的 PIC 中实际部署这些器件的严格要求：高隔离比、最小插入损耗、宽带操作、小占地面积、无源操作、极化多样性以及与可扩展硅制造的兼容性。该计划将通过开发第一个满足上述所有要求的硅光隔离器，为这一挑战提供变革性的解决方案。除了探索器件设计和加工创新以实现前所未有的高性能外，该计划还将通过利用标准硅制造工艺在美国集成光子制造研究所 (AIM Photonics) 进行原型设计来验证隔离器器件的可扩展制造和集成，然后后端兼容的磁光石榴石材料的整体沉积。这种多方面的方法将提供一个实用的解决方案，以弥合当前片上隔离器与其在 PIC 中部署的目标之间的巨大性能差距，并解决集成光子学界面临的长期挑战。该奖项反映了 NSF 的法定使命，并已被通过使用基金会的智力优点和更广泛的影响审查标准进行评估，认为值得支持。

项目成果

Thickness-dependent magnetooptical properties of ion beam sputtered polycrystalline Ce1Y2Fe5O12 films

离子束溅射多晶 Ce1Y2Fe5O12 薄膜的厚度相关磁光特性

• DOI: 10.1016/j.optmat.2022.112967
• 发表时间: 2022-11
• 期刊: Optical Materials
• 影响因子: 3.9
• 作者: Yoshihara, Yuki;Sugita, Tomoya;Lim, Pang Boey;Tamba, Yasuyuki;Inoue, Hiroaki;Ishiyama, Kazushi;Inoue, Mitsuteru;Ross, Caroline A.;Goto, Taichi
• 通讯作者: Goto, Taichi

High Figure of Merit Magneto‐Optical Ce‐ and Bi‐Substituted Terbium Iron Garnet Films Integrated on Si

硅上集成的高品质因数磁石光学陶瓷和铋取代铽铁石榴石薄膜

• DOI: 10.1002/adom.202100512
• 发表时间: 2021-05-31
• 期刊: Advanced Optical Materials
• 影响因子: 9
• 作者: Takian Fakhrul;S. Tazlaru;B. Khurana;L. Beran;J. Bauer;Michal Vančík;A. Marchese;Ekaterina Tsotsos;M. Kucera;Yan Zhang;M. Veis;C. Ross
• 通讯作者: C. Ross

Revealing Site Occupancy in a Complex Oxide: Terbium Iron Garnet

揭示复杂氧化物的位点占用：铽铁石榴石

• DOI: 10.1002/smll.202300824
• 发表时间: 2023-04
• 期刊: Small
• 影响因子: 13.3
• 作者: Rosenberg, Ethan;Bauer, Jackson;Cho, Eunsoo;Kumar, Abinash;Pelliciari, Jonathan;Occhialini, Connor A.;Ning, Shuai;Kaczmarek, Allison;Rosenberg, Richard;Freeland, John W.;et al
• 通讯作者: et al

Substrate‐Dependent Anisotropy and Damping in Epitaxial Bismuth Yttrium Iron Garnet Thin Films

外延铋钇铁石榴石薄膜中的基底相关各向异性和阻尼

• DOI: 10.1002/admi.202300217
• 发表时间: 2023-08-09
• 期刊: Advanced Materials Interfaces
• 影响因子: 5.4
• 作者: Takian Fakhrul;Bharat Khurana;H. Nembach;J. Shaw;Yabin Fan;G. Riley;Luqiao Liu;C. Ross
• 通讯作者: C. Ross

Crystallization and stability of rare earth iron garnet/Pt/gadolinium gallium garnet heterostructures on Si

Si上稀土铁石榴石/Pt/钆镓石榴石异质结构的结晶及稳定性

• DOI: 10.1016/j.jmmm.2022.170043
• 发表时间: 2022-12
• 期刊: Journal of Magnetism and Magnetic Materials
• 影响因子: 2.7
• 作者: Gross, Miela J.;Bauer, Jackson J.;Ghosh, Supriya;Kundu, Subhajit;Hayashi, Kensuke;Rosenberg, Ethan R.;Andre Mkhoyan, K.;Ross, Caroline A.
• 通讯作者: Ross, Caroline A.