MsRI-EW: Precision Nanoscale Patterning and Characterization – From Cybernetic Proteins to Nanoengineered Quantum Devices

MsRI-EW：精密纳米级图案化和表征 - 从控制论蛋白质到纳米工程量子设备

基本信息

批准号：
2034637
负责人：
Suchismita Guha
金额：
$ 4.19万
依托单位：
University of Missouri-Columbia
依托单位国家：
美国
项目类别：
Standard Grant
财政年份：
2020
资助国家：
美国
起止时间：
2020-07-01 至 2021-06-30
项目状态：
已结题

来源：
https://www.nsf.gov/awardsearch/showAward?AWD_ID=2034637&HistoricalAwards=false
关键词：
MsRI EW Precision Nanoscale Patterning

项目摘要

Nontechnical:An enormous challenge lies in developing nanoscale patterning methods to combine nanoelectronics with biological systems. Conventional patterning techniques have severe limitations when combining hard and soft materials. For example, electron beam lithography (EBL) can create patterns only a few nanometers in size, but requires sacrificial resists. These resists can be incompatible with biological materials and have environmental and safety concerns. Ice lithography is a novel technique that uses solid condensed gas instead of resist. This technique offers a path to atomically precise manufacturing to create nanophotonic and nanolectronic structures. There is, however, no such infrastructure in the United States. This conference will lay the foundations for a world-unique high precision facility that combines ice lithography with in-situ electron and scanning probe microscopy.Technical:The overarching goal of this multidisciplinary workshop is to bring together scientists and researchers from engineering, physics, chemistry, and biology in order to exchange ideas in recent innovations and trends in high resolution (below 5 nm) nanofabrication and characterization techniques. The workshop will highlight the science and technology at the cross-roads of quantum phenomena and bio-inspired materials. The natural self-assembly process, inherent to several classes of bio-inspired materials, has resulted in some of the most intriguing nanostructures. Tailoring the functionality of these structures remains a challenge that requires new processes for nanopatterning and nanofabrication. The workshop will provide a unique platform for researchers in academia and industry for envisioning a path forward towards advancing 3D nanofabrication, additive manufacturing, and nano-electronic devices using ice lithography. Additionally, the workshop will serve as a forum for integrating ideas on the synthesis and nanoscale characterization of functional nanomaterials and devices that seamlessly bridge condensed matter and biology. The workshop will lay the foundation for the establishment of future research infrastructure.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

非技术性：一个巨大的挑战在于开发纳米级图案方法，将纳米电子学与生物系统结合起来。结合硬材料和软材料时，常规的图案技术具有严重的限制。例如，电子束光刻（EBL）只能创建大小的少数纳米模式，但需要牺牲抗拒。这些抵抗力可能与生物材料不兼容，并且存在环境和安全问题。冰光刻是一种新型技术，它使用固体冷凝的气体而不是抵抗。该技术为原子上精确的制造提供了一条途径，以创建纳米光子和纳米元素结构。但是，美国没有这样的基础设施。这次会议将为世界唯一的高精度设施奠定基础，该设施将冰光刻与原位电子和扫描探针显微镜结合在一起。技术：该多学科研讨会的总体目标是将科学家和研究人员融合在一起，以使工程，物理，化学和生物学从最新的Innof Innof和趋势（以下趋势）（以下5 NM）中进行介绍（以下高级学科）（技术。该研讨会将在量子现象和生物启发的材料的交叉路口突出科学和技术。自然的自组装过程固有的几类生物启发的材料固有，导致了一些最吸引人的纳米结构。调整这些结构的功能仍然是一个挑战，需要纳米图案和纳米制作的新过程。该研讨会将为学术界和行业的研究人员提供一个独特的平台，以设想使用冰光刻的3D纳米制作，增材制造和纳米电子设备的前进道路。此外，研讨会将作为一个论坛，以整合有关功能性纳米材料和设备的纳米级表征的思想，这些纳米材料和设备无缝地弥合了凝结的物质和生物学。该研讨会将为建立未来的研究基础设施奠定基础。该奖项反映了NSF的法定任务，并通过使用基金会的知识分子优点和更广泛的影响审查标准来评估，被认为值得通过评估。