MRI: Acquisition Of an Atomic Layer Deposition System

MRI：原子层沉积系统的采集

基本信息

批准号：
1828090
负责人：
Hanwei Gao
金额：
$ 30.1万
依托单位：
Florida State University
依托单位国家：
美国
项目类别：
Standard Grant
财政年份：
2018
资助国家：
美国
起止时间：
2018-08-01 至 2021-07-31
项目状态：
已结题

来源：
https://www.nsf.gov/awardsearch/showAward?AWD_ID=1828090&HistoricalAwards=false
关键词：
MRI Acquisition Atomic Layer Deposition

项目摘要

This award from the Major Research Instrumentation program supports Florida State University (FSU) with the acquisition of an Atomic Layer Deposition (ALD) system. The system will enhance the materials research and education in the northern Florida region. ALD is an advanced thin film deposition technique with a unique operating principle enabling thin film deposition with unprecedented precision of thickness down to single atomic layers. Applications of ALD, in both industrial and academic research, have led to remarkable advancements in materials development for microelectronics, sustainable energy, advanced batteries, chemical and biological sensing, lighting and display technology, etc. The ALD system acquired through this award will be installed in the Condensed Matter and Materials Physics (CMMP) User Facility where the impact of the instrument will be maximized with broad access available to the entire research community in the region, including minority-serving institutions, and women's colleges as well as industrial partners. This facility will also serve as a basis for student training and education at all level from K-12 to graduate schools.The Atomic Layer Deposition (ALD) system will particularly enhance the nanofabrication capabilities at Florida State University (FSU) by creating thin films with pinhole-free quality, conformal morphology, and atomic layer precision. With its strong commitments in materials research, FSU is in pressing need of these unique features and capabilities especially since materials and devices with three-dimensional surface microstructures have become increasingly involved in recent research activities. At least fifteen research groups at FSU and FAMU, in disciplines spanning across physics, chemistry & biochemistry, chemical & biomedical engineering, mechanical engineering, and electrical engineering, will benefit immediately from regular access to an ALD system, covering research subjects from nanoelectronics, nanophotonics, solar energy harvesting, energy storage, photocatalysis, and spintronics. Not only will the current research projects benefit from this instrument acquisition, new collaborative activities are expected to be inspired by sharing the ALD in an interactive and multidisciplinary environment.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

重大研究仪器计划的奖项通过获得原子层沉积（ALD）系统支持佛罗里达州立大学（FSU）。该系统将增强佛罗里达州北部地区的材料研究和教育。 ALD是一种先进的薄膜沉积技术，具有独特的操作原理，可实现薄膜沉积，厚度前所未有的精度向下到单个原子层。 ALD在工业和学术研究中的应用都导致了微型电子学，可持续能源，高级电池，化学和生物传感，照明和展示技术等材料开发方面的显着进步。将在该奖项中获得的ALD系统将安装在浓缩物质和材料物理学（CMMP）的较小程度上，该工具的影响很小，该工具的影响很大，该工具的影响很大机构，妇女大学以及工业伙伴。该设施还将作为从K-12到研究生院各个级别的学生培训和教育的基础。原子层沉积（ALD）系统将特别增强佛罗里达州立大学（FSU）的纳米型能力，通过与无针质质量的薄膜，无针质的质量，相结合的形态和原子层精确度。 FSU凭借其在材料研究方面的坚定承诺，迫切需要这些独特的功能和功能，尤其是因为具有三维表面微观结构的材料和设备已经越来越参与最近的研究活动。 At least fifteen research groups at FSU and FAMU, in disciplines spanning across physics, chemistry & biochemistry, chemical & biomedical engineering, mechanical engineering, and electrical engineering, will benefit immediately from regular access to an ALD system, covering research subjects from nanoelectronics, nanophotonics, solar energy harvesting, energy storage, photocatalysis, and spintronics.当前的研究项目不仅将从此工具获取中受益，而且预计将通过在互动和多学科环境中共享ALD来启发新的合作活动。该奖项反映了NSF的法定任务，并被认为是值得通过基金会的知识分子优点和更广泛的审查标准来通过评估来获得支持的。