Fabrication of High Performance Metasurfaces by Nanoimprinting of Refractive Index

通过折射率纳米压印制造高性能超表面

• 批准号: 1825787
• 负责人: Judson Ryckman
• 金额: $ 34.93万
• 依托单位: Clemson University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2018
• 资助国家: 美国
• 起止时间: 2018-09-01 至 2022-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1825787&HistoricalAwards=false
• 关键词: Fabrication; Performance; Metasurfaces; Nanoimprinting; Refractive

This grant supports manufacturing research that advances knowledge pertaining to the fabrication of optical devices, an effort which promotes scientific progress in emerging technologies with the potential to advance national health, prosperity, and defense. Specifically, this research advances key capabilities in cost-effective nanomanufacturing of components known as metasurfaces, which can be tailored to manipulate light with almost arbitrary wavefront shaping control. This important technology holds relevance in areas such as biomedical imaging, optical communications, laser imaging detection and ranging, and optical management for laser trapping and solar energy applications. Nearly all currently available manufacturing processes for producing metasurfaces rely on structuring optical materials through patterning followed by material etching or deposition. This general approach faces fundamental limitations which impact metasurface performance, manufacturing yield, and scalability. This project conducts fundamental research that investigates an innovative fabrication pathway wherein a material's optical properties are directly manipulated and patterned at high resolution without any deposition or etching. In addition to supporting the fabrication of existing metasurface architectures this approach uniquely enables new metasurface designs offering superior operating bandwidths and fabrication tolerances. This award supports training of skilled workers to enter into science, technology, engineering, and math careers, provides support for research experiences at the undergraduate level, offers opportunities to integrate research within the undergraduate classroom, encourages women and underrepresented minorities and supports local outreach activities which fosters interest in science for K-12 students.The technical scope of this work includes: (a) developing a method for patterning refractive index on the surface of a chip with nanoscale resolution, (b) mapping the morphological tuning of porous nanomaterials to effective optical properties, (c) demonstrating the straight-forward fabrication of high performance metasurfaces with both binary and arbitrary refractive index profiles, and (d) offering a transformative new approach for non-resonant (broadband) phase control which overcomes interparticle spacing limitations and improves fabrication tolerance. This research focuses on a technique wherein porous substrates are locally imprinted and densified at high resolution by direct imprinting with three-dimensionally mastered stamps then planarized. With the aim of developing this nanomanufacturing approach to enable the cost effective fabrication of high performance metasurfaces, this research addresses key questions regarding process parameters, process variation and control, mechanical integrity, optical quality, and process limitations.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

该赠款支持制造研究，该研究促进了与光学设备的制造有关的知识，这项努力促进了新兴技术的科学进步，并有可能提高国家健康，繁荣和防御。 具体而言，这项研究提高了称为Metasurfaces的成分成本效率的纳米制造，可以量身定制以通过几乎任意的波前塑形控制来操纵光线。 这项重要的技术在生物医学成像，光学通信，激光成像检测和范围以及激光诱捕和太阳能应用的光学管理等领域具有相关性。 几乎所有目前可用于生产元信息的制造过程都依赖于通过图案进行构造材料，然后进行材料蚀刻或沉积。这种一般方法面临着影响超出表面性能，制造产量和可扩展性的基本限制。该项目进行了基础研究，该研究研究了一种创新的制造途径，其中材料的光学特性以高分辨率而没有任何沉积或蚀刻的直接操纵和图案。除了支持现有的跨表面体系结构的制造外，此方法独特地启用了新的metasurface设计，可提供出色的操作带宽和制造公差。该奖项支持培训熟练的工人进入科学，技术，工程和数学职业，为本科层面的研究经历提供支持，提供了将研究纳入本科课堂内的研究的机会，鼓励妇女和代表性的少数群体，并为当地的外展活动提供了对K-12学生的兴趣的本地外展活动。纳米级分辨率，（b）将多孔纳米材料的形态调整映射到有效的光学特性上，（c）证明了具有直接的高性能跨国质量制造，并具有二元和任意折射率谱图，以及（d）为非谐波（宽带）限制的限制性限制的二进制和任意屈光度指数概况，以及（d）提供了一种变革性的新方法。这项研究的重点是一种技术，通过直接印有三维掌握的邮票，在高分辨率上局部印有多孔底物并在高分辨率上致密。为了开发这种纳米制造方法以实现高性能跨面的成本效益，该研究解决了有关过程参数，过程变化和控制，机械完整性，光学质量和过程限制的关键问题。该奖项反映了NSF的法规任务，并认为通过基金会的知识优点和广泛的范围进行评估，这是值得通过评估来进行评估的。

项目成果

Nanoimprinting of Refractive Index: Patterning Subwavelength Effective Media for Flat Optics

折射率纳米压印：平面光学的亚波长有效介质图案化

• DOI: 10.1021/acsanm.0c01395
• 发表时间: 2020
• 期刊: ACS Applied Nano Materials
• 影响因子: 5.9
• 作者: Talukdar, Tahmid H.;Perez, Julius C.;Ryckman, Judson D.
• 通讯作者: Ryckman, Judson D.

Twistoptics in 1D: Silicon moiré photonic crystals

一维扭曲学：硅莫尔光子晶体

• DOI: 10.1109/gfp51802.2021.9673817
• 发表时间: 2021
• 期刊: 2021 IEEE 17th International Conference on Group IV Photonics (GFP
• 作者: Talukdar, Tahmid H.;Hardison, Anna;Ryckman, Judson D.
• 通讯作者: Ryckman, Judson D.

Fabrication of Waveguides and Gradient Index Flat Optics by Nanoimprinting Refractive Index

通过纳米压印折射率制造波导和梯度折射率平面光学器件

• DOI: 10.1364/cleo_si.2022.sth4p.6
• 发表时间: 2022
• 期刊: Technical Digest Series
• 作者: Hardison, Anna L.;Talukdar, Tahmid H.;Kravchenko, Ivan I.;Ryckman, Judson D.
• 通讯作者: Ryckman, Judson D.

Digital and Gradient Refractive Index Planar Optics by Nanoimprinting Mesoporous Silicon

• DOI: 10.1002/adom.202201597
• 发表时间: 2022-11-10
• 期刊: ADVANCED OPTICAL MATERIALS
• 影响因子: 9
• 作者: Hardison，Anna L.;Talukdar，Tahmid H.;Ryckman，Judson D.
• 通讯作者: Ryckman，Judson D.

Digital and Gradient Refractive Index Planar Optics by Nanoimprinting Mesoporous Silicon (Advanced Optical Materials 24/2022)

通过纳米压印介孔硅实现数字梯度折射率平面光学（先进光学材料 24/2022）

• DOI: 10.1002/adom.202270095
• 发表时间: 2022
• 期刊: Advanced Optical Materials
• 影响因子: 9
• 作者: Hardison, Anna L.;Talukdar, Tahmid H.;Kravchenko, Ivan I.;Ryckman, Judson D.
• 通讯作者: Ryckman, Judson D.