Contacts to Layered Dichalcogenide Semiconductors
与层状二硫属化物半导体的接触
基本信息
- 批准号:1410334
- 负责人:
- 金额:$ 33.6万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:2014
- 资助国家:美国
- 起止时间:2014-07-15 至 2019-06-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Non-technical Description: Two-dimensional layered semiconductors have recently captured the imagination of scientists and engineers because of their unusual physical properties and potential for many applications. For example, transistors fabricated from these materials could be used in consumer electronics; photovoltaics derived from the materials could offer greater energy independence; and molecular sensing using these materials could aid homeland security. To realize the potential of these new materials and use them efficiently in a variety of devices, it is critical to understand and develop electrical contacts that allow current to flow in and out of the devices without significant losses. A graduate student and undergraduate students are receiving direct training in science and engineering research methods as they address this scientific problem. The principal investigator is also gaining experience that informs upper-level material science and engineering courses, as well as outreach activities for underrepresented middle- and high-school students.Technical Description: This project addresses the need for low-resistance Ohmic contacts for two-dimensional layered dichalcogenide semiconductors, including molybdenum disulfide and tantalum diselenide. Investigators are using thermodynamic calculations and phase diagrams to select metal contacts that are likely to exhibit different types of reactions upon annealing. The scenarios for reaction include diffusion of the metal into the semiconductor, substitution of other transition metals for molybdenum or tungsten, and formation of a different layered semiconductor with a different band gap. Such reactions offer the potential to dope the semiconductor or alter the Schottky barrier height at the metal/semiconductor interface, and they could therefore reduce the resistance of the contacts. The reactions are under study using transmission electron microscopy (including aberration-corrected scanning/transmission electron microscopy), which is well suited to detecting changes in the arrangement of atoms at or near the metal/semiconductor interface. Researchers also employ complementary approaches to measure specific contact resistance and gain greater insight into current transport through the contacts. The project contributes to a deeper understanding of contacts to two-dimensional layered dichalcogenide semiconductors and more generally to the science of processing layered materials.
非技术描述:二维层状半导体最近因其不寻常的物理特性和许多应用的潜力而引起了科学家和工程师的想象力。例如,由这些材料制造的晶体管可用于消费电子产品;由这些材料衍生的光伏发电可以提供更大的能源独立性;使用这些材料的分子传感可以帮助国土安全。为了发挥这些新材料的潜力并在各种设备中有效地使用它们,了解和开发允许电流流入和流出设备而不会造成重大损失的电接触至关重要。研究生和本科生在解决这一科学问题时正在接受科学和工程研究方法的直接培训。首席研究员还获得了为高级材料科学和工程课程以及针对代表性不足的初中和高中学生的外展活动提供信息的经验。技术说明:该项目解决了两个低电阻欧姆接触的需求立体层状二硫族化物半导体,包括二硫化钼和二硒化钽。研究人员正在使用热力学计算和相图来选择在退火时可能表现出不同类型反应的金属触点。反应的情况包括金属扩散到半导体中、用其他过渡金属替代钼或钨、以及形成具有不同带隙的不同层状半导体。此类反应提供了掺杂半导体或改变金属/半导体界面处的肖特基势垒高度的潜力,因此可以降低接触的电阻。正在使用透射电子显微镜(包括像差校正扫描/透射电子显微镜)研究这些反应,该显微镜非常适合检测金属/半导体界面处或附近原子排列的变化。研究人员还采用补充方法来测量特定的接触电阻,并更深入地了解通过触点的电流传输。该项目有助于更深入地了解二维层状二硫属化物半导体的接触,更广泛地有助于层状材料加工科学。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Suzanne Mohney其他文献
Suzanne Mohney的其他文献
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{{ truncateString('Suzanne Mohney', 18)}}的其他基金
REU Site: Nanomanufacturing of Emerging 2D Materials and Devices
REU 网站:新兴 2D 材料和器件的纳米制造
- 批准号:
2244201 - 财政年份:2023
- 资助金额:
$ 33.6万 - 项目类别:
Standard Grant
NSF-BSF: New Approaches to Contacts to 2D Semiconductors
NSF-BSF:二维半导体接触新方法
- 批准号:
2227346 - 财政年份:2022
- 资助金额:
$ 33.6万 - 项目类别:
Standard Grant
NSF-BSF: New Approaches to Contacts to 2D Semiconductors
NSF-BSF:二维半导体接触新方法
- 批准号:
2227346 - 财政年份:2022
- 资助金额:
$ 33.6万 - 项目类别:
Standard Grant
Nanoengineering Electrodes for Reliable Microelectromechanical Ohmic Contact Switches
用于可靠微机电欧姆接触开关的纳米工程电极
- 批准号:
0800619 - 财政年份:2008
- 资助金额:
$ 33.6万 - 项目类别:
Standard Grant
Contacts to Group III Nitride Semiconductor Alloys
III 族氮化物半导体合金联系人
- 批准号:
0308786 - 财政年份:2003
- 资助金额:
$ 33.6万 - 项目类别:
Continuing Grant
Acquisition of a Field Emission Electron Gun for a Scanning Auger Microscope
获取用于扫描俄歇显微镜的场发射电子枪
- 批准号:
0216779 - 财政年份:2002
- 资助金额:
$ 33.6万 - 项目类别:
Standard Grant
Integration of Technology into the Materials Science and Engineering Curriculum
将技术融入材料科学与工程课程
- 批准号:
9952597 - 财政年份:2000
- 资助金额:
$ 33.6万 - 项目类别:
Standard Grant
REU Site: Materials Stability and Reliability
REU 网站:材料稳定性和可靠性
- 批准号:
9731860 - 财政年份:1998
- 资助金额:
$ 33.6万 - 项目类别:
Continuing Grant
CAREER: Native Oxides on the III-V Nitrides and Chemical Cleaning of the Semiconductor Surfaces
职业:III-V 族氮化物上的天然氧化物和半导体表面的化学清洗
- 批准号:
9624995 - 财政年份:1996
- 资助金额:
$ 33.6万 - 项目类别:
Continuing Grant
Investigation of Factors Affecting the Performance of Electrical Contacts to Gallium Nitride
氮化镓电触头性能影响因素的研究
- 批准号:
9504259 - 财政年份:1995
- 资助金额:
$ 33.6万 - 项目类别:
Standard Grant
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