SNM: Atomically Precise, Defect Free, DNA Masks with Embedded Metrology

SNM：具有嵌入式计量功能的原子级精确、无缺陷 DNA 掩模

• 批准号: 1344915
• 负责人: William Hughes
• 金额: $ 149.99万
• 依托单位: Boise State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2014
• 资助国家: 美国
• 起止时间: 2014-03-01 至 2019-02-28
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1344915&HistoricalAwards=false
• 关键词: SNM; Atomically; Precise; Defect; Free

This grant addresses the technical and policy barriers confronted by the semiconductor industry in creating next generation memory devices. The objectives of the grant are to: (I) enable high-volume manufacturing of atomically-precise, defect-free patterns made from synthetic DNA, (II) self-report defects using an in-line optical technique to monitor the quality control of patterns during high-volume production, and (III) create a policy framework that guides public-private collaborations in scalable nanomanufacturing.If successful, solving these industrial challenges will help: (A) validate molecular self-assembly as a cost-effective manufacturing process for scalable nanomanufacturing, (B) establish novel process techniques for scalable nanomanufacturing, (C) overcome critical roadblocks in semiconductor device fabrication at the nanoscale, and (D) address societal implications of the large-scale production and use of DNA as an engineered nanomaterial. The research will also advance the discovery, innovation, and overall knowledge-based prosperity of science and engineering in Idaho, an EPSCoR State.

该赠款解决了半导体行业在创建下一代内存设备方面面临的技术和政策障碍。 The objectives of the grant are to: (I) enable high-volume manufacturing of atomically-precise, defect-free patterns made from synthetic DNA, (II) self-report defects using an in-line optical technique to monitor the quality control of patterns during high-volume production, and (III) create a policy framework that guides public-private collaborations in scalable nanomanufacturing.If successful, solving these industrial challenges will帮助：（a）有效的分子自组装作为可扩展纳米制造的成本效益的制造过程，（b）建立用于可扩展纳米制造的新型过程技术，（c）克服纳米级半导体设备制造中的关键障碍，以及（d）解决大型nan nan of dna of dna的社会含义。这项研究还将推进EPSCOR州爱达荷州科学与工程学的发现，创新和整体基于知识的繁荣。

项目成果

DNA Nanostructures-Mediated Molecular Imprinting Lithography

• DOI: 10.1021/acsnano.6b04777
• 发表时间: 2017-01-01
• 期刊: ACS NANO
• 影响因子: 17.1
• 作者: Tian, Cheng;Kim, Hyojeong;Liu, Haitao
• 通讯作者: Liu, Haitao