Symposium EE: Self-Organization and Nanoscale Pattern Formation; for the MRS Fall meeting in Boston

EE研讨会：自组织和纳米级图案形成；

• 批准号: 1157235
• 负责人: Pascal Bellon
• 金额: --
• 依托单位: Materials Research Society
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2012
• 资助国家: 美国
• 起止时间: 2012-01-15 至 2012-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1157235&HistoricalAwards=false
• 关键词: Symposium; EE; Self; Organization; Nanoscale

Symposium EE, "Self-Organization and Nanoscale Pattern Formation", will be held at the 2011 MRS Fall meeting in Boston. It will bring together a large community of researchers who utilize self-organization and self-assembly to synthesize and functionalize nanostructured materials. The symposium will cover a broad spectrum of materials, from polymeric and supra-molecular systems, to semiconductors, oxides, and metals, and a broad spectrum of applications, ranging from photonics and plasmonics, to gas sensors, catalytic materials, and materials subjected to irradiation or plastic deformation. The underlying principles responsible for self-organization are often similar in these situations, so the symposium will provide opportunities for researchers from one particular area to learn and potentially transfer recent knowledge gained in other areas. The requested support will be used to facilitate the participation of graduate students, female researchers, and researchers from underrepresented minorities. The high cost of attending the symposium can prevent some graduate students to attend, present their research results and inhibit exposure to the state-of-the-art research and acquiring direct feedback on their research from senior researchers. Offering a partial support to offset registration fees and traveling costs provides an effective means to ensure a broad participation from graduate students. The field of self-organization and self-assembly for the synthesis and investigation of nanostructures is extremely active and diverse, and attendance at this symposium is expected to have beneficial impacts on the careers of these researchers.

研讨会 EE，“自组织和纳米级图案形成”，将于 2011 年波士顿 MRS 秋季会议上举行。它将汇集一大批利用自组织和自组装来合成和功能化纳米结构材料的研究人员。研讨会将涵盖从聚合物和超分子系统到半导体、氧化物和金属的广泛材料，以及从光子学和等离子体激元到气体传感器、催化材料和受环境影响的材料的广泛应用。辐照或塑性变形。在这些情况下，负责自组织的基本原理通常是相似的，因此研讨会将为某一特定领域的研究人员提供学习并可能转移在其他领域获得的最新知识的机会。所请求的支持将用于促进研究生、女性研究人员和代表性不足的少数族裔研究人员的参与。参加研讨会的高昂费用可能会阻碍一些研究生参加、展示他们的研究成果，并阻碍他们接触最先进的研究并从资深研究人员那里获得有关他们研究的直接反馈。提供部分支持来抵消注册费和差旅费，是确保研究生广泛参与的有效手段。用于纳米结构合成和研究的自组织和自组装领域非常活跃和多样化，参加本次研讨会预计将对这些研究人员的职业生涯产生有益的影响。