Dynamic Maskless Holographic Lithography

动态无掩模全息光刻

• 批准号: 0928353
• 负责人: Daniel Cole
• 金额: $ 30万
• 依托单位: University of Pittsburgh
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-08-15 至 2013-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0928353&HistoricalAwards=false
• 关键词: Dynamic; Maskless; Holographic; Lithography

This research will develop a new lithographic technique called dynamic maskless holographic lithography (DMHL) that achieves maskless lithography by combining holograms and spatial light modulators with photolithography to produce patterns in two and three dimensions. This is a new paradigm in photolithography. Significantly, this process does not require a mask, eliminating a manufacturing step. It provides an approach to micro (and eventually nano) lithography that, if successful, will have low operating costs, low capital investment, and would be flexible in process. The application of holograms to photolithography gives the opportunity to produce patterns in three dimensions, and controlling this using a computer provides flexibility and the ability to manipulate light in real-time, something that cannot be done with fixed masks. The high cost of mask-sets puts conventional lithography out of range for many users; as such, a maskless approach to lithography that is flexible is desirable. An ideal lithography technique would include low operating and capital cost, high fidelity, flexibility in process and materials, ability to pattern on near- or non-planar surfaces, and the ability to manufacture in three dimensions. The DMHL process developed in this research meets many of these criteria. DMHL provides new opportunities for education in optics, microscopy, nanosystems, and lithography. There is a potential future tie-in with an RET program at the University of Pittsburgh, which will bring MEMS engineering and microfabrication to high school teachers, benefiting students in the science and math classroom.

这项研究将开发一种新的光刻技术，称为动态无掩模全息光刻（DMHL），该技术通过将全息图和空间光调节剂与光刻术结合在一起，在两个和三个维度中产生模式，从而实现无掩模光刻。 这是光刻学的新范式。 值得注意的是，此过程不需要面罩，消除了制造步骤。 它提供了一种微型（最终是纳米）光刻的方法，如果成功的话，将具有较低的运营成本，资本投资较低，并且将在过程中灵活。 全息图在光刻学上的应用使有机会在三个维度上产生模式，并且使用计算机对其进行控制提供了灵活性和实时操纵光的能力，这是用固定口罩无法完成的。 蒙版的高成本使许多用户的传统光刻范围不超出范围。因此，需要一种灵活的无掩模的光刻方法。 理想的光刻技术将包括低运营和资本成本，高保真度，过程和材料的灵活性，在近或非平面表面上进行模式的能力以及在三个维度上制造的能力。 这项研究中开发的DMHL过程符合许多标准。 DMHL为光学，显微镜，纳米系统和光刻的教育提供了新的机会。 匹兹堡大学将与RET计划进行潜在的搭配，该计划将为高中教师带来MEMS工程和微协会，从而使科学和数学课程的学生受益。