Exploring the Influence of Deposition Conditions on the Microstructure and Growth Kinetics of Nitrogen Doped Carbonaceous Thin Films

探讨沉积条件对氮掺杂碳质薄膜微观结构和生长动力学的影响

• 批准号: 0616873
• 负责人: Howard Fairbrother
• 金额: $ 38.5万
• 依托单位: Johns Hopkins University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2006
• 资助国家: 美国
• 起止时间: 2006-09-01 至 2010-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0616873&HistoricalAwards=false
• 关键词: Exploring; Influence; Deposition; Conditions; Microstructure

AbstractCHE-0616873Fairbrother/Johns HopkinsWith the support of the Analytical and Surface Chemistry Program, Professor Fairbrother and his colleagues at the Johns Hopkins University are studying the kinetics and morphology of the growth of hydrogenated amorphous carbon nitride films. A model plasma reactor, consisting of a methyl radical source and hydrogen and nitrogen ion sources, is used to controllably grow these films. Characterization of the films by X-ray photoelectron spectroscopy, infrared spectroscopy, and atomic force microscopy is correlated with film growth parameters and the resulting growth kinetics. These films have broad application as hard coatings in the disk drive and optics industries, and a fundamental understanding of their growth may impact these industries as well as thin film growth in general. Multidisciplinary education of researchers in this laboratory results from these studies. A fundamental understanding of the dependence of film growth kinetics and morphology related to the composition of growth plasmas is the goal of this research being carried out in the laboratory of Professor Fairbrother at the Johns Hopkins University. Film characterization coupled with controlled growth conditions provides information about the mechanisms and kinetics of growth. This information is useful in the design of processes for the production of tribological and optical films and coatings.

Abstractche-0616873Fairbrother/Johns Hopkinswith是分析和表面化学计划的支持，Fairbrother教授及其同事在约翰霍普金斯大学（Johns Hopkins University）正在研究氢化无晶碳氮化碳氮化碳的生长的动力学和形态。 模型血浆反应器，该反应器由甲基自由基以及氢和氮离子源组成，用于可控生长这些膜。 通过X射线光电子光谱，红外光谱和原子力显微镜对膜的表征与膜生长参数和所得生长动力学相关。 这些电影在磁盘驱动器和光学行业中具有广泛的应用，并且对其增长的基本了解可能会影响这些行业以及一般的薄膜增长。 这些研究的研究人员对研究人员的多学科教育。 对与增长等离子体组成有关的电影生长动力学和形态学依赖性的基本理解是在约翰·霍普金斯大学（Johns Hopkins University）的Fairbrother教授实验室进行的这项研究的目标。 膜表征加上受控生长条件，提供了有关生长机制和动力学的信息。 该信息可用于设计摩擦学和光学薄膜和涂料的过程。