Exploring the Influence of Deposition Conditions on the Microstructure and Growth Kinetics of Nitrogen Doped Carbonaceous Thin Films

探讨沉积条件对氮掺杂碳质薄膜微观结构和生长动力学的影响

• 批准号: 0616873
• 负责人: Howard Fairbrother
• 金额: $ 38.5万
• 依托单位: Johns Hopkins University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2006
• 资助国家: 美国
• 起止时间: 2006-09-01 至 2010-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0616873&HistoricalAwards=false
• 关键词: Exploring; Influence; Deposition; Conditions; Microstructure

AbstractCHE-0616873Fairbrother/Johns HopkinsWith the support of the Analytical and Surface Chemistry Program, Professor Fairbrother and his colleagues at the Johns Hopkins University are studying the kinetics and morphology of the growth of hydrogenated amorphous carbon nitride films. A model plasma reactor, consisting of a methyl radical source and hydrogen and nitrogen ion sources, is used to controllably grow these films. Characterization of the films by X-ray photoelectron spectroscopy, infrared spectroscopy, and atomic force microscopy is correlated with film growth parameters and the resulting growth kinetics. These films have broad application as hard coatings in the disk drive and optics industries, and a fundamental understanding of their growth may impact these industries as well as thin film growth in general. Multidisciplinary education of researchers in this laboratory results from these studies. A fundamental understanding of the dependence of film growth kinetics and morphology related to the composition of growth plasmas is the goal of this research being carried out in the laboratory of Professor Fairbrother at the Johns Hopkins University. Film characterization coupled with controlled growth conditions provides information about the mechanisms and kinetics of growth. This information is useful in the design of processes for the production of tribological and optical films and coatings.

摘要CHE-0616873Fairbrother/约翰霍普金斯大学在分析和表面化学项目的支持下，约翰霍普金斯大学的Fairbrother教授和他的同事正在研究氢化非晶氮化碳薄膜生长的动力学和形态。 由甲基自由基源以及氢和氮离子源组成的模型等离子体反应器用于可控地生长这些薄膜。 通过 X 射线光电子能谱、红外光谱和原子力显微镜对薄膜进行表征，与薄膜生长参数和由此产生的生长动力学相关。 这些薄膜作为硬涂层在磁盘驱动器和光学行业中具有广泛的应用，对其生长的基本了解可能会影响这些行业以及整个薄膜的生长。 该实验室研究人员的多学科教育就是这些研究的结果。 约翰·霍普金斯大学 Fairbrother 教授实验室进行的这项研究的目标是从根本上了解薄膜生长动力学和形态与生长等离子体成分的依赖性。 薄膜表征与受控生长条件相结合提供了有关生长机制和动力学的信息。 该信息对于摩擦学和光学薄膜及涂层的生产工艺设计非常有用。