Photolithography: A Novel Approach to Controlled Study of Crack Healing and Pore Morphology Evolution

光刻法：裂纹愈合和孔隙形态演化受控研究的新方法

• 批准号: 8821328
• 负责人: Andreas Glaeser
• 金额: $ 32.43万
• 依托单位: University of California-Berkeley
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1989
• 资助国家: 美国
• 起止时间: 1989-06-15 至 1993-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8821328&HistoricalAwards=false
• 关键词: Photolithography; Novel; Approach; Controlled; Study

This research consists of a three year study of crack healing and pore morphology evolution using engineered flaws in controlled-misorientation doped and undoped sapphire bicrystals. The flaws are created by photolithographic techniques which allow, for the first time, detailed and independent analyses of the effects of grain boundary misorientation (structure) and chemistry on high temperature crack healing and pore morphology evolution processes (which occur in sintering and diffusion bonding of ceramics and multilayer laminates). Detailed characterization of these processes is being done using optical microscopy, scanning electron microscopy, and scanning transmission electron microscopy with microchemical analysis.

这项研究包括利用受控定向误差掺杂和未掺杂蓝宝石双晶中的工程缺陷对裂纹愈合和孔隙形态演化进行为期三年的研究。 这些缺陷是通过光刻技术产生的，该技术首次能够详细、独立地分析晶界取向错误（结构）和化学对高温裂纹愈合和孔隙形态演化过程（发生在烧结和扩散结合过程中）的影响。陶瓷和多层层压板）。 这些过程的详细表征正在使用光学显微镜、扫描电子显微镜和扫描透射电子显微镜与微量化学分析来完成。