Oxide/hydroxide incorporation into electrodeposited CoFe alloys—Consequences for magnetic softness

Presented work investigates conditions at the electrode/solution interface leading to incorporation of Fe(OH)3 into CoFe thin films. The oxygen content and coercivity of CoFe films is studied as a function of Fe3+ ion concentration in the solution. These results are analyzed through the scope of analytical model describing the oxygen presence in CoFe films as a consequence of Fe(OH)3 incorporation phenomenon. The scanning transmission electron microscopy study with nanometer scale resolution for composition analysis has elucidated the alteration in grain structure of CoFe films due to Fe(OH)3 incorporation. These findings directly implicate Fe(OH)3 incorporation as a reason for the increase in coercivity of CoFe films.

本研究探讨了电极/溶液界面处导致氢氧化铁（Fe(OH)₃）掺入钴铁（CoFe）薄膜的条件。研究了钴铁薄膜的氧含量和矫顽力随溶液中三价铁离子（Fe³⁺）浓度的变化情况。通过一个分析模型对这些结果进行了分析，该模型将钴铁薄膜中氧的存在描述为氢氧化铁掺入现象的结果。利用具有纳米级分辨率的扫描透射电子显微镜进行成分分析的研究，阐明了由于氢氧化铁掺入导致的钴铁薄膜晶粒结构的变化。这些发现直接表明氢氧化铁掺入是钴铁薄膜矫顽力增加的一个原因。