Manufacturing and metrology of 3D holographic structure nanopatterns in roll-to-roll fabrication

Eliminating the need for multilayer alignment in nanoscale manufactured devices will streamline the lithography process and open up avenues for flexible substrate roll-to-roll (R2R) manufacturing. A system capable of single-exposure 3D holographic lithography with in-line metrology and real-time feedback will revolutionize micro and nano manufacturing. Work towards such developments are demonstrated to show promise in the field of nanopatterning.

在纳米级制造设备中消除多层对准的需求将简化光刻工艺，并为柔性基底卷对卷（R2R）制造开辟途径。一个能够进行单次曝光三维全息光刻且具备在线测量和实时反馈的系统将给微纳制造带来革命性变化。朝着此类发展所做的工作在纳米图案化领域显示出了良好的前景。