Optical limiting properties in copper oxide thin films under a high-repetition-rate femtosecond laser

CuO nanocrystalline thin films are deposited on quartz substrates by pulsed laser deposition. The grown single-phase CuO films are characterized by X-ray diffraction, X-ray photoelectron spectrometer and transmission electron microscopy. The optical nonlinearity of CuO films is investigated by the Z-scan method under a high-repetition-rate (HRR) femtosecond laser (800 nm, 50 fs, 80 MHz). The CuO nanocrystalline films are found to be good optical limiters with a limiting threshold of 0.3 GW/cm(2) and a damage threshold of 1.65 GW/cm(2). The possible mechanisms of the optical limiting are also proposed. (c) 2012 Elsevier B.V. All rights reserved.

通过脉冲激光沉积法在石英衬底上沉积氧化铜纳米晶薄膜。利用X射线衍射、X射线光电子能谱仪和透射电子显微镜对生长的单相氧化铜薄膜进行表征。在高重复频率（HRR）飞秒激光（800纳米，50飞秒，80兆赫兹）下，采用Z扫描方法研究氧化铜薄膜的光学非线性。发现氧化铜纳米晶薄膜是良好的光限幅器，其限幅阈值为0.3吉瓦/平方厘米，损伤阈值为1.65吉瓦/平方厘米。还提出了光限幅的可能机制。（c）2012爱思唯尔有限公司。保留所有权利。