金刚石薄膜对电子束流强放大特性的数值模拟

In order to fully understand the amplification characteristics of the diamond film in the diamond-amplified photocathode electron gun for the primary electron beam current intensity and its relationship with other factors, the PIC module of the VSIM software was used to numerically simulate the physical characteristics of the diamond-amplified electron beam current intensity. The results presented the quantitative relationships between the maximum amplification factor of the electron beam current intensity and factors such as the primary electron beam energy, the internal field strength of the diamond film, and the thickness of the diamond film. The simulation results showed that by selecting appropriate primary electron beam energy and internal field strength of the diamond film, the maximum amplification factor of the electron beam current intensity can reach two orders of magnitude.

为充分了解用于金刚石放大光阴极电子枪中的金刚石薄膜对初级电子束流强的放大特性及与.其他因素的关系，利用ＶＳＩＭ 软件的ＰＩＣ模块对金刚石放大电子束流强的物理特性进行了数值模拟，结果给出.了电子束流强的最大放大倍数与初级电子束能量、金刚石薄膜内部场强及金刚石薄膜厚度等因素的定量关系。.模拟结果显示，选择合适的初级电子束能量和金刚石薄膜内部场强，电子束流强的最大放大倍数可以达到两个.数量级。