PMMA材料表面高功率脉冲磁控溅射低温下制备ITO薄膜及机理研究

The PMMA material has excellent characteristics of high visible light transmittance，mechanical strength, corrosion resistance and easy processing. The devices produced by ITO film-coated PMMA have a outstanding photoelectric properties, such as high visible light transmittance, infrared reflectivity, UV absorptivity, conductivity, etc, and a widespread application prospect in the field of aerospace, weapons and equipment, and industrial production. The high power pulsed magnetron sputtering (HPPMS) technology has a unique advantage in preparing quality ITO film on the PMMA substrate, with the feature of high ionization rate, low film deposition temperature and excellent film performance. This project to carry out a detailed study of the ITO film deposited on the PMMA substrate both in the film preparation experiment and film growth mechanism. Using HPPMS technology to prepare coatings, analyze the photoelectric properties and membrane-binding performance of the film combined with the thin film growth and the conductive/ light transmission mechanism. Summarize the influence of the preparation process of the film properties for the purpose of process optimized. The research purpose is to solve scientific and technological issues of preparing the quality photoelectric properties TCO film on the PMMA surface under low temperature with well combined performance., and lay the foundation for HPPMS technique used in low-temperature coating deposition.

有机玻璃（PMMA）具有极好的透光性和机械强度，且具备耐腐蚀、易加工等特性。镀膜PMMA器件（ITO+PMMA）以优异的光电性能，高可见光透过率、红外反射率、紫外吸收率、电导率及对微波的衰减性等，在航空航天、武器装备和工业生产等领域具有广泛的应用前景。高功率脉冲磁控溅射技术以高的溅射粒子离化率，低的膜层沉积温度和优异的膜层性能，在PMMA基体低温制备优质ITO膜方面具有独特优势。 本项目在膜层制备实验和膜层成长机理两方面开展PMMA基体表面ITO膜制备的详细研究。采用高功率脉冲磁控溅射方法制备涂层，分析制备膜层的光电性能及膜基结合性能，并结合簿膜成长和导电透光机理,归纳制备工艺对膜层性能的影响规律，指导工艺优化,解决PMMA基体表面，低温下制备的透明导电氧化物薄膜的光电性能和膜基结合性能差的关键科技问题，为高功率脉冲磁控溅射技术应用于低温涂层沉积奠定基础。