基于注氧隔离三维雕刻的应变硅制备与非线性极化率研究

Strained silicon can break through the natural properties of silicon, and the second order optical susceptibility can be induced in strained silicon by breaking the inversion symmetry of silicon through the strain, so strained silicon is a significant research direction of silicon photonics. We have proposed and validated a new strained silicon fabrication technology, namely Separation by Implantation Oxygen (SIMOX) 3 Dimension (3D) sculpting, which has the advantages of highly efficient use of wafer real estate and 3-dimension integration of devices. SIMOX 3D sculpting has became one of the most promising strained silicon fabrication technology, but its mechanical model and strained silicon fabrication processes are the key issues need to be solved. This project will focus on the following: (1) research the physical processes and stress change of SIMOX 3D sculpting, and establish a mechanical model to simulate the stress change during the fabrication of strained silicon; (2) use tip-enhanced Raman spectroscopy to explore the relationship between the stress in the strained silicon waveguide and the fabrication process parameters; (3) use the second harmonic generation experiment to measure the second order nonlinear susceptibility in the strained silicon waveguide, and reveal the relationship between the second order nonlinear susceptibility and the stress. Through the above research work, we should lay the theoretical and experimental basis for the fabrication of strained silicon waveguide with controllable stress and adjustable second order nonlinear polarizability, and promote the further development of silicon photonics.

应变硅可以突破硅的自然属性，通过应力破坏硅的反演对称性，在硅中诱导出本来没有的二阶非线性极化率，是硅光子学的重要研究方向。本项目组已经提出并且验证一种制备应变硅的新技术——注氧隔离三维雕刻技术，该技术具有硅基利用率高、三维光电器件集成的优点，成为最具潜力的应变硅制备技术之一，但是其力学模型、应变硅制备工艺，是目前迫需解决的关键问题。本项目将重点研究：（1）注氧隔离三维雕刻技术的物理机理及应力变化，建立动态力学模型，模拟制备应变硅过程中应力变化；（2）结合具有高分辨率应力测量优势的针尖增强拉曼光谱技术，探索硅波导中的应力随制备工艺参数变化关系；（3）利用二次谐波产生实验测量应变硅波导中的二阶非线性极化率，揭示应变硅波导中应力诱导二阶非线性极化率的规律。通过以上研究工作，为制备应力可控的、二阶非线性极化率可调的应变硅波导奠定理论与实验基础，促进硅光子学的进一步发展。

注氧隔离三维雕刻技术是一种制备应变硅的新技术，为制备应力可控的、二阶非线性极化率可调的应变硅波导，促进硅光子学的进一步发展，本项目开展应变硅力学模型、制备工艺研究。主要研究内容包括三维雕刻技术的物理机理与动态力学模型、应力分布与制备工艺参数、应力诱导二阶非线性极化率机理。解决三维雕刻技术制备应变硅过程中应力难以控制、应力随制备工艺参数变化的关系不明确、二阶非线性极化率与应力分布不确定等问题。发展了三维雕刻技术制备应变硅的力学模型、明确应变硅波导中应力随 SIMOX 三维雕刻制备工艺参数变化关系、揭示应变硅波导中应力诱导二阶非线性极化率的规律，为制备应力可控的、二阶非线性极化率可调的应变硅波导奠定理论与实验基础。

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