Fabrication of sub-wavelength nanostructure array for optical filter applications

用于光学滤波器应用的亚波长纳米结构阵列的制造

• 批准号: 561100-2020
• 负责人: Cui, Bo
• 金额: $ 2.19万
• 依托单位: University of Waterloo
• 依托单位国家: 加拿大
• 项目类别: Alliance Grants
• 财政年份: 2020
• 资助国家: 加拿大
• 起止时间: 2020-01-01 至 2021-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=707350
• 关键词: Fabrication; sub; wavelength; nanostructure; array

Optical filter is an essential component for optoelectronic and photonic devices. One issue is that, when light strikes an optical filter surface from air, some of the light is reflected back into the air which is an optical loss for the desired wavelength and an undesirable effect. To counter this effect, the supporting company, Iridian, currently applies anti-reflective coatings on the filter surface to reduce reflection and allow as much of the desired light to pass through. This approach works fairly well in the visible and near infra-red wavelength range for some applications including fiber optics telecommunications, analytical equipment, and multi-dimensional cameras. Anti-reflective coatings however, can be time-consuming and challenging because of complex multiple layer designs and material limitations for longer wavelengths used in applications such as night vision cameras and remote sensing for security and military purposes, and gas sensors for hazardous gas detections. The available materials are very limited for anti-reflective coatings in the medium and far infra-red wavelength range because of the optical loss from light absorptions. Alternative and advanced technologies for making anti-reflective materials are highly desired. In this project, Iridian will leverage Dr. Cui's expertise in the nanofabrication capabilities at University of Waterloo in developing nanoscale surface materials using nanoimprint technology to address the challenges associated with anti-reflecting coating in these spectrums. Nanoimprint lithography promises the possibility of eliminating the need for costly coatings by offering extremely high resolution, low cost, and high throughput, thus fits perfectly for the nanostructure fabrication. Therefore, this project will focus on the fabrication of nanostructure surface using nanoimprint lithography and thin film etching techniques for optical filter application.

滤光片是光电和光子器件的重要组成部分。一个问题是，当光从空气中照射到滤光片表面时，一些光会反射回空气中，这对于所需波长来说是一种光学损失，并且会产生不良影响。为了抵消这种影响，支持公司益瑞电 (Iridian) 目前在滤光片表面应用抗反射涂层，以减少反射并允许尽可能多的所需光线通过。对于光纤通信、分析设备和多维相机等某些应用，这种方法在可见光和近红外波长范围内效果相当好。然而，由于复杂的多层设计以及用于安全和军事目的的夜视摄像机和遥感以及用于危险气体检测的气体传感器等应用中使用的较长波长的材料限制，抗反射涂层可能非常耗时且具有挑战性。由于光吸收造成的光学损失，可用于中红外和远红外波长范围内的抗反射涂层的材料非常有限。非常需要用于制造抗反射材料的替代和先进技术。在该项目中，益瑞电将利用崔博士在滑铁卢大学纳米制造能力方面的专业知识，利用纳米压印技术开发纳米级表面材料，以解决与这些光谱中的抗反射涂层相关的挑战。纳米压印光刻通过提供极高的分辨率、低成本和高产量，有望消除对昂贵涂层的需求，因此非常适合纳米结构的制造。因此，该项目将重点关注使用纳米压印光刻和薄膜蚀刻技术制造纳米结构表面，用于光学滤波器应用。