High-resolution Electron Beam Lithography Critical Mass Grant

高分辨率电子束光刻临界质量补助金

• 批准号: EP/I000933/1
• 负责人: Edmund Harold Linfield
• 金额: $ 342.45万
• 依托单位: University of Leeds
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2011
• 资助国家: 英国
• 起止时间: 2011 至 无数据
• 项目状态: 已结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FI000933%2F1
• 关键词: resolution; Electron; Beam; Lithography; Critical

Nanotechnology is a significant enabling research activity at both a national and international level. Concerned with the manipulation and arrangement of material on the nanometre-scale, the transformative possibilities of this field are immense for the physical, biological and medical sciences and their allied industrial and clinical applications. The universities of Leeds, York and Sheffield have an exceptionally strong international record of research and research-led teaching in nanotechnology and represent a strong regional focus in the UK in this field. Much research is carried out collaboratively and inter-disciplinarily in well-resourced and sustainably managed facilities.However, despite the strength of such existing activities, it is clear that certain capabilities require an urgent and substantial transformation if we are to continue to offer internationally competitive research in this field over the next decade. Specifically - and the objective of this proposal - there is a pressing need to establish a state-of-the-art electron-beam lithography machine for fabrication of structures with a <10 nm resolution, with highly reproducible stitching and overlay accuracy <20 nm. The proposed facility would not only be unique in the region, but will also be leading both in the UK and internationally. It will meet the future needs of researchers over the next decade and beyond, allow us to capitalise on previous investments, grow research income from a wide variety of sources, attract and retain the highest calibre staff in the UK, and build a capability to develop a skill-set for ambitious, adventurous and transformative research, and exploitation. Furthermore, it will act as a focus in the region, drawing in researchers from industry and other universities for collaborative programmes. Such direct engagement with industry will open up routes for further investment as well as exploitation of new science and technology. A wide range of research will benefit, much cross-disciplinary; immediate exemplars, drawing upon proven track records of the investigators, include research into nanomagnetism, spintronics, bio-nanotechnology, nanoelectronics, single-molecule devices, and high-frequency electronics, inter alia. During this programme, the facility will be used to support both a range of existing grants, and to underpin future grants, many of which cannot be contemplated without the planned enhancement in capability.Significant contributions to this project (41% of the overall project value) have been secured from the University of Leeds, where the new facility will be based, Yorkshire Forward (the regional development agency), and the electron beam lithography instrument manufacturer. The latter two contributions will be combined to provide funding for 10 PhD studentships to aid uptake of the instrument from researchers across the region, enable pump-priming proving research to be carried out, draw industrial involvement into the project, and increase the availability of skilled personnel at a world leading level to facilitate high technology development. The strong industrial support for this programme is evidenced by letters of intent provided both by international companies (eg Hitachi, Intel, Seagate, Toshiba), and local SMEs (eg Aptuscan).

纳米技术在国家和国际层面都是重要的研究活动。与纳米尺度上的材料操纵和布置有关，该领域的变革性可能性对于物理，生物学和医学科学及其相关的工业和临床应用是巨大的。利兹大学，约克和谢菲尔德的大学在纳米技术领域的研究和研究主导教学方面具有出色的国际记录，并在英国代表了该领域的强烈区域重点。在资源丰富且可持续管理的设施中进行了许多研究，进行了协作，跨学科。尽管如此，尽管有这种现有活动的实力，但很明显，某些能力需要紧急而实质性的转变，如果我们继续提供国际竞争激烈的竞争力在接下来的十年中，该领域的研究。具体而言，这是该提案的目的 - 需要建立一台最先进的电子束光刻机器，用于制造<10 nm分辨率的结构，具有高度可重现的缝线和覆盖精度<20 nm 。拟议的设施不仅在该地区是独一无二的，而且还将在英国和国际上领先。它将满足未来十年及以后的研究人员的未来需求，让我们能够利用以前的投资，从各种来源增加研究收入，吸引和保留英国的最高才能的员工，并建立发展的能力雄心勃勃，冒险和变革性研究和剥削的技能。此外，它将成为该地区的重点，吸引工业和其他大学的研究人员进行协作计划。这种与行业的直接参与将开辟进一步投资以及对新科学技术的开发。广泛的研究将受益，跨学科。借助研究人员的可靠记录的直接示例包括对纳米磁性，旋转型，生物纳米技术，纳米电子，单分子设备以及高频电子电子学的研究。在该计划期间，该设施将用于支持一系列现有赠款，并支撑未来的赠款，而没有计划的能力提高，就无法考虑其中的许多赠款。 ）已从利兹大学（University of Leeds）确保了新工厂将在该大学，约克郡前进（区域开发局）和电子束光刻仪器制造商。后两项贡献将合并为为10个博士学位学生提供资金，以帮助该地区的研究人员吸收该乐器，使得能够进行泵宣传，以证明泵宣传研究，吸引工业参与该项目，并增加熟练的熟练性。世界领先水平的人员促进高科技发展。国际公司（例如日立，英特尔，西门特，东芝）和当地中小型企业（例如Aptuscan）提供了意向书，这对该计划的强烈工业支持证明了这一计划。

项目成果

Continuously tuneable critical current in superconductor-ferromagnet multilayers

超导铁磁体多层膜中连续可调的临界电流

• DOI: 10.1063/1.4989693
• 发表时间: 2017
• 期刊: Applied Physics Letters
• 影响因子: 4
• 作者: Curran P

Suppression of Dynamically Induced Stochastic Magnetic Behavior Through Materials Engineering

• DOI: 10.1103/physrevapplied.13.024039
• 发表时间: 2020-02
• 期刊: Physical Review Applied
• 影响因子: 4.6
• 作者: T. J. Broomhall;A. Rushforth;M. Rosamond;E. Linfield;T. Hayward

Development of phase shift lithography for the production of metal-oxide-metal diodes

开发用于生产金属氧化物金属二极管的相移光刻技术

• DOI: 10.1049/mnl.2014.0102
• 发表时间: 2014
• 期刊: Micro & Nano Letters
• 影响因子: 1.3
• 作者: Dodd L

Spin relaxation through Kondo scattering in Cu/Py lateral spin valves

通过 Cu/Py 横向自旋阀中近藤散射的自旋弛豫

• DOI: 10.1103/physrevb.92.220420
• 发表时间: 2015
• 期刊: Physical Review B
• 影响因子: 3.7
• 作者: Batley J

Heusler alloys for spintronic devices: review on recent development and future perspectives.

• DOI: 10.1080/14686996.2020.1812364
• 发表时间: 2021-03-29
• 期刊: Science and technology of advanced materials
• 影响因子: 5.5
• 作者: Elphick K;Frost W;Samiepour M;Kubota T;Takanashi K;Sukegawa H;Mitani S;Hirohata A
• 通讯作者: Hirohata A