Next generation XUV source for time-resolved nano-ARPES and PEEM

用于时间分辨纳米 ARPES 和 PEEM 的下一代 XUV 源

• 批准号: 22K18270
• 负责人: Dani Keshav
• 金额: $ 16.47万
• 依托单位: Okinawa Institute of Science and Technology Graduate University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Challenging Research (Pioneering)
• 财政年份: 2022
• 资助国家: 日本
• 起止时间: 2022-06-30 至 2025-03-31
• 项目状态: 未结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-22K18270/
• 关键词: Extreme UV light source; High order; harmonic generation; XUV-PEEM; Nano-APRES; Twisted 2D materials; Moire pattern; Extreme Ultraviolet; Higher Harmonic; Angle resolved; photoemission; electron microscopy

Nanoscale spatial resolution imaging and nano-ARPES with the XUV photon source with high enough photon flux has been the goal of this Kakenhi proposal. Such a resolution allows the complete investigation of the nanoscale variations in the electronic structure of a material. In this fiscal year, we have finished setting up a new XUV beamline, which provides a flux density of 4 x1018 photons/sec/cm2 that is two-order in magnitude higher than what we have previously done. We have coupled this beamline to an electron microscope. In our initial test runs, we demonstrated that we are capable of doing imaging with XUV photon reaching a spatial resolution better than 100nm and we can also perform APRES with few micron spatial resolution. We have also started a study on twisted 2D materials, preliminary result shows that we can image and resolve different ferroelectric domains in the moire structure.

Kakenhi 提案的目标是采用具有足够高光子通量的 XUV 光子源的纳米级空间分辨率成像和纳米 ARPES。这样的分辨率可以对材料电子结构的纳米级变化进行完整的研究。在本财年，我们完成了新的 XUV 光束线的设置，其通量密度为 4 x1018 光子/秒/cm2，比我们之前所做的高出两个数量级。我们已将该光束线与电子显微镜耦合。在我们的初始测试中，我们证明了我们能够使用 XUV 光子进行成像，达到优于 100nm 的空间分辨率，并且我们还可以以几微米的空间分辨率执行 APRES。我们还开始了对扭曲二维材料的研究，初步结果表明我们可以对莫尔结构中的不同铁电域进行成像和解析。

项目成果

Stanford University(米国)

斯坦福大学（美国）