The Role of defects which play in the process of functional degradation in environmental resisting properties of ceramic coatings

功能退化过程中缺陷对陶瓷涂层耐环境性能的影响

基本信息

批准号：
09450053
负责人：
KIMURA Yuji
金额：
$ 5.89万
依托单位：
Kogakuin UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
1997
资助国家：
日本
起止时间：
1997 至 1998
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09450053/
关键词：
coated TiN thin film Plasma CVD and DIM method initial stages of localized corrosion E-AFM in-situ observation defect ratio type of defects mixing layer electrohemical measurement CVD,IMコーティング AFM観察

项目摘要

Thin film coatings toward various types of materials have been used for protecting substrate surface from corrosion damages or adding a lot of functions to them. Till now the studies have been mainly conducted concerning mechanical and chemical properties of TiN thin film coating. Therefore in this study, basic properties such as corrosion-resisting characteristics of CVD and PVD coatings were investigated from the viewpoint of defect in coated layer and adhesion properties between coating and substrate. The roles of defects, which play in the process of functional degradation in environment resistant characteristics of coatings, were examined. And then, improvement in these characteristics of coatings by making better the adhesion state between coating and substrate is investigated.Results obtained are summarized as follows ;(1) Extremely initial stages of localized corrosion process in coated TiN thin film in 3%NaCl aqueous solution was investigated by detailed mum or urn orders observations using Atomic Force Microscope (AFM). As a result, it was observed that correlation between localized corrosion morphologies and type of defects. Moreover, crevice corrosion characteristics were controlled by the adhesion properties between thin film and substrate was recognized.(2) TiN thin film coatings used in this study were made by two different types of coating methods, that is, Plasma CVD and Dynamic Ion Mixing (DIM) method. Then, defect morphology and the initial stage of localized corrosion morphology of urn or mum orders in 3% NaCl aqueous solution was investigated by Atomic Force Microscope (AEM). As a result, difference in the types of defects and localized corrosion morphologies were dearly observed depending upon the coating methods.(3) Electrochemical AFM in-situ observation of the types of defects and initial localized corrosion process on TiN thin film made by different coating methods can be conducted under various electrochemically controlled conditions.

针对各种类型材料的薄膜涂层已用于保护基材表面免受腐蚀损坏或为其添加许多功能。目前的研究主要集中在TiN薄膜涂层的机械性能和化学性能方面。因此，本研究从镀层缺陷以及镀层与基体间的附着力的角度对CVD和PVD镀层的耐腐蚀特性等基本性能进行了研究。研究了缺陷在涂层耐环境特性的功能退化过程中所起的作用。然后，研究了通过改善涂层与基体之间的附着状态来改善涂层的这些特性。所得结果总结如下：（1）涂层TiN薄膜在3%NaCl水溶液中的极初始阶段的局部腐蚀过程使用原子力显微镜 (AFM) 通过详细的妈妈或瓮订单观察进行了研究。结果，观察到局部腐蚀形态与缺陷类型之间的相关性。此外，缝隙腐蚀特性是由薄膜与基体之间的附着力控制的。(2)本研究中使用的TiN薄膜涂层是通过两种不同类型的涂层方法制成的，即等离子CVD和动态离子混合(暗淡）方法。然后利用原子力显微镜(AEM)研究了瓮或mum目在3% NaCl水溶液中的缺陷形貌和初始阶段局部腐蚀形貌。结果表明，不同涂层方法的缺陷类型和局部腐蚀形貌存在明显差异。(3)电化学AFM原位观察不同涂层制备的TiN薄膜的缺陷类型和初始局部腐蚀过程方法可以在各种电化学控制条件下进行。