Development and its Application of Functional Membranes by Molecular Imprint Technique via Phase Inversion Precipitation

反相沉淀分子印迹技术开发功能膜及其应用

• 批准号: 09650842
• 负责人: KOBAYASHI Takaomi
• 金额: $ 1.86万
• 依托单位: Nagaoka University of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09650842/
• 关键词: Molecular imprinting; Functional Membranes; Separation Membranes; Recognition; Temlate; Polymer; Permeability; Membrane separation; 高分子膜; 鋳型分子; 分子刷り込み; カフェイン; 相分離法; ポリアクリロニトリル; ポリアミド; 刷り込み特性; テオフィリン

Phase inversion of polyacrylonitrile copolymers with carboxylic acid groups was applied to prepare molecular imprinting membranes of theophylline (THO). The copolymer cast solution of dimethylsulfoxide (DMSO) with the THO template was immersed in water and then the polymer including the template is coagulated in the nonsolvent. After removal of the template from the solidified copolymer membrane, high selectivity for THO molecule was recognized compared to Caffeine recognition by the THO imprinted-membranes. The molecular imprint process was affected by the template concentration in the DMSO cast solution, coagulation condition and carboxylic acid contents in the copolymer. The high binding selectivity of THO solute to the THO imprinted copolymer membrane arise from the formation of the imprinted sites, which consist of free OH group of carboxylic acid segments for hydrogen bonds with the solute

采用羧酸基的聚丙烯硝基烯共聚物的相位反转以制备茶碱（THO）的分子印迹膜。将二甲基硫氧化二甲基硫氧化物（DMSO）与THO模板浸入水中的共聚物铸溶液，然后将包括模板在内的聚合物凝结在非分发物中。从固化共聚物膜中去除模板后，与印迹膜识别的咖啡因识别相比，识别出对THO分子的高选择性。分子烙印过程受DMSO铸造溶液，凝结条件和共聚物中羧酸含量的模板浓度的影响。溶质与印迹共聚物膜的高结合选择性是由印迹位点的形成产生的，这些位点的形成由溶质的氢键组成的游离OH组组成

项目成果

T. Kobayashi, H. Y. Wang, T. Fukaya and N. Fujii: "Recognition with Imprinted Polymers, ACS Symposium Series 703, Washington DC"Molecular Imprint Membranes Prepared by Phase Inversion of Polyacrylonitrile Copolymers with Carboxylic Acid Groups. 13 (1998)

T. Kobayashi、H. Y. Wang、T. Fukaya 和 N. Fujii：“印迹聚合物识别，ACS 研讨会系列 703，华盛顿特区”通过带有羧酸基团的聚丙烯腈共聚物的相转化制备分子印迹膜。

T.Kobayashi,H.Y.Wang,T.Fukaya and N.Fujii,: "Recogition with Imprinted Polymers,ACS Symposium Series703,Washington,DC," Molecular Imprint Membranes Prepared by Phase Inversion of Polyacrylonitrile Copolymers With Carboxylic Acid Groups,13 (1998)

T.Kobayashi、H.Y.Wang、T.Fukaya 和 N.Fujii，“Recogition with Imprinted Polymers，ACS Symposium Series703，华盛顿特区”，通过带羧酸基团的聚丙烯腈共聚物相转化制备分子印迹膜，13 (1998)

Kobayashi et al: "Molecular imprint membranes polyacrylonitrile copolymers with different acrylic acid segments"Analytica Chimica Acta. 365. 81-88 (1999)

Kobayashi 等人：“具有不同丙烯酸片段的聚丙烯腈共聚物分子印迹膜”Analytica Chimica Acta。

Kobayashi et al.: "Porous Nylon-6 membranes with dithioamino groups for low pressure desalination"Journal of Applied Polymer Science. 75. 1546-1553 (2000)

Kobayashi 等人：“用于低压海水淡化的带有二硫氨基的多孔尼龙 6 膜”应用聚合物科学杂志。

Hong Ying Wang,Takaomi Kobayashi and Nobuyuki Fujii,: "Surface Molecular Imprinting on Photosensitive Dithiocarbamoyl Polyacrylonitrile Membrane using Photograft Polymerization" J.Chemical Tech.& Biotech.,. 70(4). 355-362 (1997)

Hong Ying Wang、Takaomi Kobayashi 和 Nobuyuki Fujii，“利用光接枝聚合在光敏二硫代氨基甲酰聚丙烯腈膜上进行表面分子印迹”J.Chemical Tech。