Explanation of reaction layer fatigue in silicon microstructure for development of highly-reliable MEMS devices

硅微结构反应层疲劳的解释，用于开发高可靠性MEMS器件

• 批准号: 19676002
• 负责人: TSUCHIYA Toshiyuki
• 金额: $ 71.8万
• 依托单位: Kyoto University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (S)
• 财政年份: 2007
• 资助国家: 日本
• 起止时间: 2007 至 2011
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-19676002/
• 关键词: シリコン; MEMS; 引張試験; 疲労試験; 酸化; 信頼性; 単結晶シリコン; 二酸化シリコン; 腐食疲労; 寿命予測; 顕微ラマン分光; 力学特性; 共振振動; 信頼化; 酸素析出欠陥; 高温試験

To design the reliability of practical MEMS devices, the models of fracture and fatigue life of silicon micro structure have been established. For fracture, it is revealed that the vertical stress against(111) plane expresses the strength and the relationship to strength and surface morphology is clarified. For fatigue life, the prediction model based on Paris' law and Weibull distribution has been examined on various fatigue life tests and the good correlation was observed. The effect of humidity on the fatigue exponent was also shown. The new dynamic stress measurement system for Si micro resonator using micro Raman spectroscopy has been developed.

为了设计实际MEMS器件的可靠性，建立了硅微结构的断裂和疲劳寿命模型。对于断裂，揭示了针对（111）面的垂直应力表示强度，并且阐明了与强度和表面形貌的关系。对于疲劳寿命，基于巴黎定律和威布尔分布的预测模型已经在各种疲劳寿命试验中得到检验，并观察到良好的相关性。还显示了湿度对疲劳指数的影响。开发了采用微拉曼光谱的新型硅微谐振器动态应力测量系统。

项目成果

Effects anisotropic elasticity on stress concentration in micro mechanical structures fabrieated on (001) single-crystal silicon films

各向异性弹性对（001）单晶硅薄膜上微机械结构应力集中的影响

• 发表时间: 2009
• 期刊: Journal of Applied Physics 4
• 作者: S.Inoue;et al.;Masato Mizutani;T. kehara
• 通讯作者: T. kehara

高温薄膜引張試験装置の開発

高温薄膜拉伸试验设备的研制

• 发表时间: 2007
• 作者: Nikaido;E.;et al.;青嶋紘;土屋智由
• 通讯作者: 土屋智由

Local stress analysis of single crystalline silicon resonator using micro raman spectroscopy

使用显微拉曼光谱分析单晶硅谐振器的局部应力

• 发表时间: 2011
• 作者: Takada;A.;A.Taniyama
• 通讯作者: A.Taniyama

Air Damping in a Fan-Shaped Rotational Resonator with Comb Electrodes

带梳状电极的扇形旋转谐振器中的空气阻尼

• 发表时间: 2008
• 期刊: IEEJ Transaction on Sensors and Micromachines 128-E
• 作者: Y. Takahashi;H. Iemura;S. A. Mahin;G. L. Fenves;Y. Uchida
• 通讯作者: Y. Uchida

Effect of Surface Oxide Layer on Mechanical Properties of Single Crystalline Silicon

表面氧化层对单晶硅力学性能的影响

• 发表时间: 2007
• 作者: K. Miyamoto;K. Sugano;T. Tsuchiya;O. Tabata
• 通讯作者: O. Tabata