Formation of Metal Films on Magnesium by Photoinduced Autocatalytic Deposition

光诱导自催化沉积在镁上形成金属薄膜

• 批准号: 14550706
• 负责人: YAE Shinji
• 金额: $ 1.54万
• 依托单位: Himeji Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2003
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-14550706/
• 关键词: Magnesium Alloy; Photo-Patterning; Photocatalyst; Corrosion Resistibility; Titanium Dioxide; Catalyzation Pretreatment; Eelctroless Plating; Nickel; 半導体超微粒子; 光電気化学

Thin films comprised of ultrafine titanium dioxide particles have been formed on magnesium alloy (AZ31) substrates. Autocatalytic deposition of metal is initiated by UV irradiation onto the TiO_2 coated magnesium alloy substrates. The metal deposition occurs only on the irradiated part of substrate, thus the photo-patterning of autocatalytically deposited metal films can be achieved without photoresist. Anodized magnesium alloy substrates have relatively high corrosion resistance. Even such anodized substrates are easily corroded by immersion into a common solution for autocatalytic plating of nickel phosphorus alloy. In order to keep the substrates in the plating solution, the pH of plating solution should be higher than the corrosion limit of magnesium alloy. Highly basic solutions for autocatalytic deposition of nickel phosphorus alloy or pure nickel films have been developed. In some cases of using such plating solutions, a two-step catalyzation pretreatment for electroless plating can be applied for the initiation of metal film deposition onto the magnesium alloy substrates. Adsorbates formed on non-conducting substrates by the pretreatment have been investigated.

由超细二氧化钛颗粒组成的薄膜已在镁合金（AZ31）基材上形成。金属的自催化沉积是通过紫外线照射到 TiO_2 涂层的镁合金基材上引发的。金属沉积仅发生在基材的受照射部分，因此无需光刻胶即可实现自催化沉积金属薄膜的光图案化。阳极氧化镁合金基材具有较高的耐腐蚀性能。即使这样的阳极氧化基材也很容易因浸入镍磷合金自催化电镀的常用溶液中而被腐蚀。为了使基体保持在镀液中，镀液的pH值应高于镁合金的腐蚀极限。已经开发出用于镍磷合金或纯镍薄膜自催化沉积的强碱性解决方案。在使用此类镀液的一些情况下，可以应用化学镀的两步催化预处理来引发金属膜沉积到镁合金基底上。已经研究了通过预处理在非导电基底上形成的吸附物。

项目成果

岡本尚樹, 八重真治, 山岸憲史, 三俣宜明, 福室直樹, 渡辺 徹, 松田 均: "無電解めっきの活性化前処理に用いられるセンシタイジング液の経時変化"表面技術. 55・4. 281-285 (2004)

Naoki Okamoto、Shinji Yae、Kenji Yamagishi、Yoshiaki Mitsumata、Naoki Fukumuro、Toru Watanabe、Hitoshi Matsuda：“用于化学镀活化预处理的敏化液随时间的变化” 55・4 (2004)。

八重真治, 濱田隆弘, 横山敦之, 伊藤 潔, 福室直樹, 松田 均: "ヒドラジンを還元剤とする無電解純ニッケルめっきの浴組成の単純化"表面技術. 55・1. 89-90 (2004)

Shinji Yae、Takahiro Hamada、Atsuyuki Yokoyama、Kiyoshi Ito、Naoki Fukumuro、Hitoshi Matsuda：“使用肼作为还原剂的化学镀纯镍浴组合物的简化”Surface Technology 55・1。

山岸憲史, 八重真治, 岡本尚樹, 福室直樹, 松田 均: "無電解めっきの二液法活性化前処理により非導電性基板上に形成される吸着物"表面技術. 54・2. 150-154 (2003)

Kenji Yamagishi、Shinji Yae、Naoki Okamoto、Naoki Fukumuro、Hitoshi Matsuda：“通过化学镀的二组分活化预处理在非导电基材上形成吸附剂”表面技术 54・2 (2003)。

S.Yae, T.Hamada, A.Yokoyama, K.Ito, N.Fukumuro, H.Matsuda: "Simplification of Solution Composition of Electroless Pure Ni Plating Using Hydrazine as a Reducing Agent"J.Surf.Fin.Soc.Jpn.. Vol.55. 89-90 (2004)

S.Yae、T.Hamada、A.Yokoyama、K.Ito、N.Fukumuro、H.Matsuda：“使用肼作为还原剂简化化学镀纯镍的溶液成分”J.Surf.Fin.Soc.Jpn

K.Yamagishi, N.Okamoto, H.Ukawa, N.Fukumuro, S.Yae, H.Matsuda: "Microscopical Morphology of Adsorbate Produced During Two--Step Catalyzation Pretreatment and Deposit Formed at Initial Stage of Electroless Ni-P Deposition on Non-Conductive Substrates"J.Sur

K.Yamagishi、N.Okamoto、H.Ukawa、N.Fukumuro、S.Yae、H.Matsuda：“两步催化预处理过程中产生的吸附物的微观形态以及化学镀 Ni-P 沉积初始阶段形成的沉积物