Crystal growth and contral of nano-level zinc alloy electrodeposits

纳米级锌合金电沉积晶体生长与控制

• 批准号: 11650745
• 负责人: KONDO Kazuo
• 金额: $ 2.11万
• 依托单位: OKAYAMA UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1999
• 资助国家: 日本
• 起止时间: 1999 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11650745/
• 关键词: Zinc; Electrodeposition; Surface treatment; Crystal growth; nano level

Atomic level composite electrodeposition has been investigated with Titania, Silica and chained Silica particles.1.Incorporation mechanism with Silica ; The author has been investigated the macrostep lateral growth on (00 1)η of zinc electrodepoists. In this investigation, an incorporation mechanism of Silica particles of 50nm on (00 1)η of zinc electrodepoistsis is reported. Silica particles can be classified with random precipitates on the (00 l)η and ordered precipitates at the macrostep edge. The random precipitates are trapped form their bottom by single atomic height steps at the initial absorbed sites. The ordered precipitates at the macrostep edges are trapped from sidewall of macrosteps. Also, we observed many Silica particles on fractured surfaces which are inside of the electrodeposits.2.Incorporation mechanism with Titania ; The titania particles consist of 10nm diameter smaller particles and 50nm larger particles. 50nm larger particles can be classified with random precipitates on the (00 1)η and ordered precipitates at the macrostep edge. 10nm smaller particles randomly precipitates on the (00 1)η. These smaller particles are trapped form their bottom by the single atomic height steps at their initial absorbed sites. At the initial stage of electrodeposition, only smaller particles are trapped.3.Incorporation mechanism with chained Silica particles ; Incorporation mechanism of chained Silica particles, multiple Silica particle forming chain, is discussed. The chained particles can be classified with random precipitates on the (00 1)η and ordered precipitates at the macrostep edge. The random chained preoipitates are trapped form their bottom by the single atomic height steps at their initial absorbed sites. The ordered chained precipitates at the macrostep edges are trapped from sidewall of macrosteps. Also, we observed chained particles randomly sticking on the (10 0)η.

原子水平的复合材料已经用二氧化硅颗粒和链式二氧化硅颗粒进行了研究。 。在电deposits的内部。围绕颗粒的TEP处于TEP。3。ca粒子形成链的固定机制。它们的底部由单个原子高度踩在其初始吸收位置。

项目成果

林 克彦,田中義之助,近藤和夫: "亜鉛-コバルト合金めっきの結晶形態"鉄と鋼. 85・4. 314-320 (1999)

Katsuhiko Hayashi、Yoshinosuke Tanaka、Kazuo Kondo：“锌钴合金镀层的晶体形态”《钢铁》85・4（1999）。

K.Kondo 他3名: "Atomic Force Microscopy Imaging the Growth Morphologies of electrodeposits"Advances in Science and Technology 20. 465-472 (1999)

K.Kondo 等 3 人：“原子力显微镜成像电沉积的生长形态”科学技术进展 20. 465-472 (1999)

K.Kondo, A.Ogishi and Z.Tanaka: "Electrodeposition of zinc- SiO_2 composite"J.Electrochem.Society. 147. 2611-2617 (2000)

K.Kondo、A.Ogishi 和 Z.Tanaka：“锌- SiO_2 复合材料的电沉积”J.Electrochem.Society。

近藤和夫,石山敬造,田中善之助: "プラズマ法によるZnO透明導電膜-ホウ素ドーパントの影響"化学工学論文集. Vol26,No2. 309-313 (2000)

Kazuo Kondo、Keizo Ishiyama、Zennosuke Tanaka：“等离子体法的 ZnO 透明导电膜 - 硼掺杂剂的影响”《化学工程杂志》第 26 卷，第 2. 309-313 期（2000 年）。

K.Kondo,A.Ogishi and Z.Tanaka: "Electrodeposition of Zinc-SiO_2 Composite"J.Electrochem.Society. 147,2611. 2611-2617 (2000)

K.Kondo、A.Ogishi 和 Z.Tanaka：“锌-SiO_2 复合材料的电沉积”J.Electrochem.Society。