Control of magnetic properties of Invar alloy by using giant stress in thin films.

利用薄膜中的巨大应力控制因瓦合金的磁性能。

基本信息

批准号：
08650765
负责人：
ISHIGURO Takashi
金额：
$ 1.41万
依托单位：
Nagaoka University of Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1996
资助国家：
日本
起止时间：
1996 至 1997
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08650765/
关键词：
Invar alloy Film stress Thin film growth Atomic magnetic moment Fe-Ni alloy Sputtered Mo film 膜応力原子磁気モーメントインバー磁性薄膜 Fe-Ni合金膜膜成長

项目摘要

Atomic magnetic moment depends on the atomic distance and/or crystalstructure. Based on this view point, the Fe-Ni alloy sputtered thin films have been investigated.As-deposited films on the glass substrates show the saturated magnetization expected from ideal alloy. The structure is, however, amorphous structure. After annealing, the structure changes into polycrystalline and saturation magnetization decreases. To obtain the f.c.c. crystalline phase in as-deposited state, Au under layr is adopted. Then, the f.c.c.phase is realized in a concentration range over the 30at%Ni. Based on this result, the Fe_<0.7>Ni_<0.3> films on the Au under layr are investigated. The atomic magnetic moment depends on the film thickness of Fe_<0.7>Ni_<0.3>. in a range less than 60nm. The crystal deformation is evaluated by using x-ray diffraction and transmission electron diffraction. Fe_<0.7>Ni_<0.3>/Au show the lattice deformation toward surface normal.On the other hand, to induce further lattice deformation on the Fe_<0.7>Ni_<0.3> films on Au under layrs, stacking of sputtered Mo layrs are examined. It is confirmed that the internal film stress of the Mo can be changed with working Ar gas pressure. In the case of Mo/Fe_<0.7>Ni_<0.3>/Au stacking structure, the lattice deformation takes place in both directions of the in-plane and surface normal direction.As the result, in the film of Fe_<0.7>Ni_<0.3> anisometric lattice deformation was observed by the stacking of Mo and/or Au layr. The corresponding atomic magnetic moment changes with the averaged lattice parameter. The trajectory of the change, however, depends on the lattice deformation.

原子磁矩取决于原子距离和/或晶体结构。基于这一观点，对Fe-Ni合金溅射薄膜进行了研究。玻璃基板上的沉积薄膜表现出理想合金所期望的饱和磁化强度。然而，该结构是非晶结构。退火后，组织变为多晶，饱和磁化强度降低。获得 f.c.c.沉积态晶相，采用Au底层。然后，在超过 30at%Ni 的浓度范围内实现 f.c.c. 相。基于该结果，研究了Au底层上的Fe_<0.7>Ni_<0.3>膜。原子磁矩取决于Fe_<0.7>Ni_<0.3>的膜厚。在小于60nm的范围内。通过使用X射线衍射和透射电子衍射来评估晶体变形。 Fe_<0.7>Ni_<0.3>/Au 表现出朝向表面法向的晶格变形。另一方面，为了在 Au 层下的 Fe_<0.7>Ni_<0.3> 薄膜上引起进一步的晶格变形，溅射 Mo 层的堆叠是检查了。证实Mo的内膜应力可以随Ar气压的变化而改变。在Mo/Fe_<0.7>Ni_<0.3>/Au堆叠结构的情况下，晶格变形发生在面内方向和表面法线方向两个方向上。因此，在Fe_<0.7>Ni_薄膜中<0.3>通过Mo和/或Au层的堆叠观察到不等轴晶格变形。相应的原子磁矩随平均晶格参数的变化而变化。然而，变化的轨迹取决于晶格变形。