Laser-driven system for the generation of coherent extreme-ultraviolet radiation

用于产生相干极紫外辐射的激光驱动系统

• 批准号: 527851411
• 金额: --
• 依托单位: Rheinisch-Westfälische Technische Hochschule Aachen
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2023
• 资助国家: 德国
• 起止时间: 2022-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/527851411?language=en
• 关键词: Laser; driven; system; generation; coherent

Due to the advancing digitalization of our society, the importance of high-performance semiconductor chips for consumer and industrial products is growing. The ability to produce and characterize the smallest structures in the range of a few nanometers in semiconductors or other functional materials is the central key technology of the developments and requires highly complex production machines that are unique in precision, throughput and reliability. In the latest generation of lithography equipment, extreme ultraviolet radiation (wavelength range from 5 to 40 nm) is used instead of deep ultraviolet radiation. To meet the increasing demands on structure size (semiconductor fabrication), quality and lifetime (optics for semiconductor production) as well as functionality (e.g. for metamaterials), fundamental properties of the light-matter interaction in the extreme-ultraviolet range and effects on components and products have to be investigated. This requires elaborated optical measurement instruments with a special laser-based radiation source, which is requested here, in combination with tailored experiments - with high requirements on emission spectrum, coherence, polarization and power. The complex relationships between light, matter, material and product in the field of nanotechnology present an interdisciplinary challenge. In the Photonics Cluster of RWTH Aachen University with the Research Center for Digital Photonic Production, scientists from six faculties of RWTH Aachen University concentrate an outstanding set of competencies in the fields of photonics, production engineering, semiconductor technology and material sciences. The proposal aims to procure a laser-driven system for the generation of coherent extreme-ultraviolet radiation (at a principal wavelength of 13.5 nm) using high harmonics. Future addressable applications can be found in metrology (time/spatially resolved spectrometry/ellipsometry, photoelectron spectrometry), microscopy (ptychography), and lithography (interference-based approaches). The outstanding expertise at the applying chair in the field of EUV technology will be strategically extended by the availability of the major instrumentation. The already realized laboratory setups form an excellent basis for future investigations and can be operated and substantially extended together with the major instrumentation to be procured. At the facility in Aachen, access to these completely new measurements and nanostructuring setups will lead to considerable added value and a distinguishing feature. To secure technological sovereignty in the EU and Germany in the future and to maintain economic and political independence, research in the field of nanotechnology is required at the highest level.

由于我们社会的数字化发展，高性能半导体芯片对于消费者和工业产品的重要性正在增长。在半导体或其他功能材料的少数纳米范围内生产和表征最小的结构的能力是开发的中心关键技术，并且需要高度复杂的生产机器，这些机器在精确，吞吐量和可靠性方面是独特的。在最新一代的光刻设备中，使用极端紫外线（波长范围为5到40 nm），而不是深紫外辐射。为了满足对结构尺寸（半导体制造）的需求不断增长的需求，质量和终生（半导体产生的光学）以及功能（例如，用于超材料），极端脱离范围的光 - 物质相互作用的基本特性以及对组件的影响和对组件的影响和对产品的影响，并且必须研究产物。这需要具有特殊基于激光的辐射源的详细的光学测量仪器，此处要求与量身定制的实验结合使用 - 对发射光谱，相干性，极化和功率的要求很高。纳米技术领域的光，物质，材料和产品之间的复杂关系提出了跨学科的挑战。来自亚太光生产研究中心的RWTH Aachen大学的光子学集群中，来自六个rwth Aachen大学学院的科学家集中在光子学，生产工程，半导体技术和材料科学领域的一系列杰出能力。该提案旨在采用激光驱动的系统，用于使用高谐波产生相干极限辐射（在主要波长为13.5 nm）。未来可寻址的应用可以在计量学（时间/空间分辨的光谱法/椭圆法，光电光谱法），显微镜（Ptychography）和光刻学（基于干扰的方法）中找到。 EUV技术领域的应用主席的出色专业知识将通过主要仪器的可用性来战略性地扩展。已经实现的实验室设置构成了未来调查的绝佳基础，并且可以与要采购的主要仪器一起进行操作和大量扩展。在亚兴的设施中，访问这些全新的测量和纳米结构设置将导致相当大的附加值和区别功能。为了确保未来欧盟和德国的技术主权并维持经济和政治独立性，在最高水平上需要在纳米技术领域进行研究。