Generation of a Large Diameter and High Density Processing Plasma

产生大直径和高密度处理等离子体

基本信息

批准号：
08405006
负责人：
TACHIBANA Kunihide
金额：
$ 7.87万
依托单位：
KYOTO UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A)
财政年份：
1996
资助国家：
日本
起止时间：
1996 至 1998
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08405006/
关键词：
Plasma Processing High Density Plasma Source Lower Hybrid Waves Wave Propagation Simulation Plasma Parameters Spatial Plasma Uniformity 空間分布特性

项目摘要

In order to meet requirements for the ULSI processing in the next generation, a new concept plasma source of large diameter and high density has been developed utilizing the wave propagation in the lower hybrid frequency range. First, the characteristics of wave propagation and power deposition in a plasma has been analyzed by a numerical simulation. It has been predicted that the radial position of the power deposition can be controlled by changing the longitudinal wave number or the external magnetic field strength. Based on this principle, a new source was designed, constructed and tested. The controllability of the radial profile of the plasma density was verified by a Langmuir probe measurement. The propagation of the lower hybrid waves was also proved from a measurement of the radial wave number measured by an electrostatic probe. The best uniformity of * 5% was attained over the diameter of 230 mm by optimizing the radial profile of the power deposition. The absolute plasma density in this plasma source is about a half of the typical value in a helicon wave plasma source, but the uniformity is much better.On the other hand, new plasma diagnostic methods have also been developed ; one is the VUV laser absorption technique for the measurement of F atoms and the other is the electron attachment mass spectroscopic technique for the measurement of polymerized species such as C_xF_y. These method were tested in various fluorocarbon plasmas currently used in the etching of SiO_2 layer in ULSIs together with our developed FT-IR phase modulated spectroscopic ellipsometry (PMSE) for the diagnostics of the surface chemical analysis. It is planned to test our new lower hybrid plasma source using these diagnostic tools for practical usage in the SiO_2 etching.

为了满足下一代ULSI处理的要求，利用较低的杂种频率范围内的波传播，已经开发出了新的概念等离子体来源。首先，通过数值模拟分析了血浆中波传播和功率沉积的特征。已经预测，可以通过更改纵向波数或外部磁场强度来控制功率沉积的径向位置。基于此原则，设计，构造和测试了一个新来源。通过Langmuir探针测量验证了血浆密度的径向谱的可控性。还通过测量通过静电探针测量的径向波数的测量证明了下部杂化波的传播。通过优化功率沉积的径向谱，在230毫米的直径上达到了 * 5％的最佳均匀性。该等离子体源中的绝对等离子体密度约为Helicon波等离子体源中典型值的一半，但是均匀性要好得多。另一方面，还开发了新的等离子体诊断方法。一种是用于测量F原子的VUV激光吸收技术，另一个是电子附着质谱技术，用于测量聚合物种，例如C_XF_Y。这些方法在目前用于ULSIS中SIO_2层的各种碳碳等离子体中进行了测试，以及我们开发的FT-IR相调制光谱椭圆法（PMSE），用于表面化学分析的诊断。计划使用这些诊断工具在SIO_2蚀刻中使用这些诊断工具来测试我们新的下层混合等离子体源。