Development of Diamond Film Synthesis at Room Temperature
室温金刚石薄膜合成研究进展
基本信息
- 批准号:05555087
- 负责人:
- 金额:$ 6.91万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Developmental Scientific Research (B)
- 财政年份:1993
- 资助国家:日本
- 起止时间:1993 至 1994
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
In this fiscal year, diamond films were synthesized by pulse modulated ECR plasma chemical vapor (CVD) deposition method using a magneto-active microwave plasma CVD system equipped with a microwave power source of 5 kW in maximum power and a infrared laser absorption spectroscopy (IRLAS) system. Optical emission spectroscopy and IRLAS measurement were also carried out in the magneto-active microwave plasma CVD.The growth rate of the diamond films by the pulse modulated plasma CVD with a maximum microwave power of 5 kW was three times as large as one of the continuous plasma of time averaged microwave power (2.5 kW) .The pulse modulated plasma was investigated by spectroscopic measurements to reveal the enhancing mechanism. The growth rate showd a drastic peaking at 500 Hz in frequency. It was observed that the time averaged CH_3 density was increased by the pulse operation. However, the methyl (CH_3) radical density did not show such a drastic change as changed the freqency was. The enhancement of diamond growth must be explained not only by the CH_3 density but also the other species enhanced by the pulse operation.It was observed in the optical emission spectroscopy that the life time of the Hydrogen radical (H) was about 1 ms in the after glow. The period of 1 ms agree with the most suitable modulation frequency, i.e., 500Hz. These result imply the importance of H radical in the diamond growth.The goal of this research, i.e., low temperature fabrication of diamond films, was almost achieved by using nanocrystal seeding for diamond nuclei. Well faceted diamond films were successfully fabricated on the Si substrates below 200゚C.It was concluded that the prevention of polymerization on the substrates was a key point to decrease the growth temperature.
在这个财政年度,使用磁极活性的脉冲模块化等离子体化学蒸气(CVD)沉积方法合成了钻石膜。系统的钻石膜通过5 kW的最大微波功率的脉冲模块化膜,是时间平均模块的连续等离子体的三倍在500 Hz的频率上显示了一个剧烈的峰值。不仅可以通过在光学发射光谱中观察到的脉冲来解释,氢自由度的寿命与最合适的调制相符,即500Hz。通过使用纳米晶种子进行钻石核的大多数。
项目成果
期刊论文数量(21)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Takuya Yara 他: "Low.Temperature Fabrication of Diamond Films with Nanocrystal Seeding" Jpn.J.Appl.Phys.34. L312-L315 (1995)
Takuya Yara 等人:“采用纳米晶体晶种的金刚石薄膜的低温制造”Jpn.J.Appl.Phys.34 (1995)。
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- 发表时间:
- 期刊:
- 影响因子:0
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- 通讯作者:
Takuya Yara他: "Fabrication of Diamond Films at Low Pressure and Low Temperature by Magneto-Active Microwave Plasma Chemical Vapor Deposition" Jpn. J. Appl. Phys.33. 4404-4408 (1994)
Takuya Yara 等人:“通过磁活性微波等离子体化学气相沉积在低压和低温下制造金刚石薄膜”J. Appl. 4404-4408 (1994)。
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- 影响因子:0
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- 通讯作者:
Nubuhiro Eimori, Yusuke Mori, Akimitsu Hatta, Toshimichi Ito and Akio Hiraki: ""Electron Affinity of Single-Crystalline Chemical-Vapor-Deposited Diamond Studied by Ultraviolet Synchrotron Radiation"" Jpn.J.Appl.Phys.vol.33. 6312-6315 (1994)
Nubuhiro Eimori、Yusuke Mori、Akkimitsu Hatta、Toshimichi Ito 和 Akio Hiraki:“通过紫外线同步辐射研究单晶化学气相沉积金刚石的电子亲和力”Jpn.J.Appl.Phys.vol.33。
- DOI:
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- 影响因子:0
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H.Yagyu 他: "Observations of the Initial Stage of Chemical-Vapor-Deposited Diamond Growth Using Transmittion Electron Microscopy" Jpn.J.Appl.Phys.32. L1775-L1777 (1993)
H. Yagyu 等人:“使用透射电子显微镜观察化学气相沉积金刚石生长的初始阶段”Jpn.J.Appl.Phys.32 (1993)。
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- 影响因子:0
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A.Hatta 他: "Pulse modulated electron cyclotron resonance plasma for chemical vapor deposition of diamond films" Appl.Phys.Left.66(印刷中). (1995)
A.Hatta 等人:“用于金刚石薄膜化学气相沉积的脉冲调制电子回旋共振等离子体”Appl.Phys.Left.66(出版中)。
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HIRAKI Akio其他文献
HIRAKI Akio的其他文献
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{{ truncateString('HIRAKI Akio', 18)}}的其他基金
Gene-gene and gene-environment interactions between polymorphisms in alcohol-metabolizing enzyme genes and the risk of gastric cancer
酒精代谢酶基因多态性与胃癌风险之间的基因-基因和基因-环境相互作用
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20590624 - 财政年份:2008
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$ 6.91万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Heteroepitaxial Nucleation and Growth of Diamond
金刚石的异质外延成核与生长
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07044312 - 财政年份:1995
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$ 6.91万 - 项目类别:
Grant-in-Aid for International Scientific Research.
Fabrication of High-Power Blue Emission Diveces Using Chemical Vapor Deposition Diamond
使用化学气相沉积金刚石制造高功率蓝色发射钻石
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63850008 - 财政年份:1988
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$ 6.91万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research (B).
Deposition of High Quality Diamond Film on Beam-Irradiated Surface Using ECR Plasma
使用 ECR 等离子体在光束照射表面沉积高质量金刚石薄膜
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62460059 - 财政年份:1987
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$ 6.91万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
Application ot blue light-emeitting diods of zns films unsing new epitaxial growth methof
蓝光发光二极管在ZnS薄膜中的应用开创外延生长新方法
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61850004 - 财政年份:1986
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$ 6.91万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research
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