Development of large-diameter RF plasmas under surface magnetic field

表面磁场下大直径射频等离子体的研制

基本信息

批准号：
04558002
负责人：
SUGAI Hideo
金额：
$ 6.02万
依托单位：
Nagoya University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Developmental Scientific Research (B)
财政年份：
1992
资助国家：
日本
起止时间：
1992 至 1994
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-04558002/
关键词：
plasma process high density plasma inductively coupled plasma helicon plasma plasma etching surface magnetic field Faraday shield indium-tin-oxide film ヘリコン波プラズマ選択ドライエッチング ITO薄膜ファラデシールドラジカルアンテナ電磁界永久磁石誘導型RF 高周波プラズマ大

项目摘要

The research and development on plasma production, diagnostics and control have been extentsively performed in order to produce a high-density, large-diameter and low-pressure plasma for materials processing. The results obtained in this study are summarized below :1.High-Density Plasma ProductionA large-diameter high-density plasma at low pressures was generated by inserting an inductive RF antenna into a vacuum vessel which is covered with surface magnetic fields. Electrostatic coupling of the antenna from plasma was shown to be suppressed by a Faraday shield. On the other hand, mechanisms of RF power absorption in a helicon plasm were investigated. Under the conditions of low magnetic fields (<100 G) and low power (<1 kW) , the RF power turned out to be deposited into a plasma via antenna nearfields rather than helicon wave fields.2.Diagnosticcs, Control and Applications of High-Density PlasmasThe detaild dignostics showed that a high electron density considerably modifies the radical composition, thus degrading an etch selectivity. Two methods to solve this problem were developed : one is a vessel wall heating (100-200ﾟC) and the other is a pulsed discharge (duration -10mus) .In addition, we developed new techniques for measuring electron density by a plasma oscillation method, electron energy distribution functi on by a biased optical probe method, and SiH_3 radical and particulates by ultravioret absorption spectroscopy.

为了生产高密度，大直径和低压等离子体的材料处理，对等离子体产生，诊断和控制的研究与发展进行了广泛的执行。本研究中获得的结果总结了下面：1。通过将电感性RF天线插入带有表面磁场覆盖的真空容器中，从而产生了低压的大直径高密度等离子体。从血浆中的天线的静电耦合显示出被法拉第盾牌抑制。另一方面，研究了Helicon血浆中RF功率抽象的机制。在低磁场（<100 g）和低功率（<1 kW）的条件下，RF功率被证明是通过近场的天线而不是Helicon Wave场沉积到血浆中的。2.Dignostics，控制和应用高密度等离子体的细节dignostics表明，高电子密度对自由度的密度认为是自由度的选择，从而选择了一个选择，从而选择了一个选择的人。开发了两种解决此问题的方法：一种是容器壁加热（100-200 c），另一种是脉冲放电（持续时间-10mus）。此外，我们开发了新技术，通过等离子振荡方法测量电子密度，通过偏置的光学探针方法在电子能量分布上通过偏置的光学探针方法和SIHIH_3 RADILAVERS和SIH_3 rAD和STRAVERSTRAVES效应。