Application of Chemical Transport Using Micro Wave Plasma to Deposition of Cubic Boron Nitride Film

微波等离子体化学输运在立方氮化硼薄膜沉积中的应用

• 批准号: 03650544
• 负责人: AKASHI Kazuo
• 金额: $ 1.28万
• 依托单位: Science University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1991
• 资助国家: 日本
• 起止时间: 1991 至 1992
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-03650544/
• 关键词: Hydrogen; Nitrogen; Boron; Boron Nitride; Radio Frequency Plasma; Micro Wave Plasma; Silicon Substrate; Chemical Transport; 石英管; プラズマ; マイクロ波; 化学輸送; CVD; 立方晶; 高周波

1. Preliminary experiments for chemical transport of boron have been carried out by using a conventional horizontal plasma reactor made of quartz glass. Boranes were generated by the reaction between solid boron particles and low pressure r.f. hydrogen plasma inductively generated. Boranes were transported on several silicon wafer substrates placed horizontally in the reactor and boron film was deposited on the substrates. When a small amount of nitrogen was mixed into the hydrogen plasma, boron nitride film was formed on each substrate. By the control of supplying plasma power, a boron film including sP^3 bonding was deposited on the substrate placed at a suitable distance from the center of plasma.2. A vertical plasma reactor made of quartz glass has been used to obtain better results for BN deposition. A BN tube was inserted into the quartz tube to prevent a chemical sputtering of its quartz wall by the low pressure inductive hydrogen plasma. By heating the substrate and applying a negative bias voltage to the substrate, pure hBN film was deposited. An auxiliary excitation of gas by a hot tungsten filament heated electrically was effective to obtain a high quality hBN film. It can be expected that experimental conditions to form BN film with cubic or wurtzite structure will be detected by controlling such auxiliary factors.3. A new vertical type of stainless steel plasma reactor was used as a trial for the chemical transport experiments. Highly excited plasma was generated by a high power microwave(MW) discharge. But it was very difficult to give a high power to plasma for a long time due to superheating of a part of the reactor. So it is necessary to improve a water cooling system of the reactor to deposit a high quality and thick BN film.

1.利用传统的石英玻璃卧式等离子体反应器进行了硼化学输运的初步实验。硼烷是通过固体硼颗粒与低压射频之间的反应生成的。感应产生氢等离子体。硼烷被输送到水平放置在反应器中的几个硅晶片基底上，并且硼薄膜沉积在基底上。当少量的氮混合到氢等离子体中时，在每个基板上形成氮化硼膜。通过控制等离子体功率的供应，在距等离子体中心适当距离的基底上沉积了包含sP^3键合的硼薄膜。 2．采用石英玻璃制成的立式等离子体反应器已用于获得更好的 BN 沉积结果。将 BN 管插入石英管中，以防止低压感应氢等离子体对其石英壁产生化学溅射。通过加热衬底并向衬底施加负偏压，沉积纯hBN薄膜。通过电加热的热钨丝辅助激发气体可以有效地获得高质量的六方氮化硼薄膜。通过控制这些辅助因素，有望找到形成立方或纤锌矿结构BN薄膜的实验条件。 3．一种新型立式不锈钢等离子体反应器被用作化学品传输实验的试验。高功率微波（MW）放电产生高度激发的等离子体。但由于反应堆的一部分过热，很难长时间向等离子体提供高功率。因此有必要对反应堆水冷系统进行改进，以沉积出高质量、厚的BN薄膜。