Change of plasma basic phenomena accompanied by electron temperature decrease

伴随电子温度降低的等离子体基本现象的变化

• 批准号: 03680002
• 负责人: IIZUKA Satoru
• 金额: $ 1.41万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1991
• 资助国家: 日本
• 起止时间: 1991 至 1992
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-03680002/
• 关键词: low energy electron; processing plasma; RF discharge; room temperature plasma; Hollow cathode; electron temperature control; plasma chemistry; reactive plasma; 低エネルギ-電子; ホロ-陰極

A novel method for a control of electron temperature of low pressure discharge plasmas, without changing pressure and discharge power, is developed and the physical mechanism is investigated. The electron temperature is controlled continuously from 5 eV to 0.04 eV. The results are summarized as follows:1) The energy control is performed by changing a construction of hollow cathode or biasing a grid in a discharge plasma.2) Cold electrons are generated by an ionization due to high energy electrons passing through a negatively biased grid.3) From the electron energy distribution, cumulative ionization due to the electrons of -5eV is an important mechanism for producing cold electrons.4) Radial profile has a good uniformity within 5 % over 30 cm in diameter.5) The energy control is possible to occur in a DC discharge, a microwave discharge, and an RF discharge as well.6) The gas species (argon, helium, hydrogen) are not intrinsical factor for the energy control.7) In reactive plasmas with methane we observe enhanced productions of negative hydrogen ion and methyl radical with a decrease in the electron temperature.The phenomena investigated here are applicable to the energy control of the processing plasma as well as the basic plasma experiments.

开发了一种在不改变压力和放电功率的情况下控制低压放电等离子体电子温度的新方法，并研究了其物理机制。电子温度连续控制在5 eV 至0.04 eV 之间。结果总结如下：1）通过改变空心阴极的结构或在放电等离子体中偏置栅极来进行能量控制。2）高能电子通过负偏置栅极时电离产生冷电子。 .3) 从电子能量分布来看，-5eV电子的累积电离是产生冷电子的重要机制。4) 径向分布在直径30 cm范围内具有良好的均匀性，在5%以内。5) 能量控制为也可能发生在直流放电、微波放电和射频放电中。6) 气体种类（氩、氦、氢）不是能量控制的内在因素。7) 在具有甲烷的反应等离子体中，我们观察到增强随着电子温度的降低，产生负氢离子和甲基自由基。这里研究的现象适用于处理等离子体的能量控制以及基本等离子体实验。

项目成果

N.Sato,S.Iizuka: "Effects of electron temperature control on an ArーCH_4 plasma" Proc.Int.Seminar on Reactive Plasmas. 1. 371-376 (1991)

N.Sato, S.Iizuka：“电子温度控制对 Ar-CH_4 等离子体的影响”Proc.Int.Seminar on Reactive Plasmas。 1. 371-376 (1991)

N. Sato, S. Iizuka, T. Koizumi, N. Sato: "Electron temperature control by movable pins installed in a hollow cathode for discharge plasma" Applied Physics Letters. Vol.62. 567-569 (1993)

N. Sato、S. Iizuka、T. Koizumi、N. Sato：“通过安装在用于放电等离子体的空心阴极中的可移动销钉进行电子温度控制”《应用物理快报》。

K. Kato, S. Iizuka, N. Sato: "A low-pressure discharge plasma with electron temperature controllable from -5 eV to -0.04 eV by a grid" Applied Physics Letters.

K. Kato、S. Iizuka、N. Sato：“低压放电等离子体，电子温度可通过栅极控制在 -5 eV 至 -0.04 eV 范围内”《应用物理快报》。

S.Iizuka,T.Koizumi,N.Sato: "An effect on electron temperature on negative hydrogen ion production in a low pressure Ar discharge plasma with methane" Applied Physic Letters. (1993)

S.Iizuka，T.Koizumi，N.Sato：“电子温度对甲烷低压 Ar 放电等离子体中负氢离子产生的影响”应用物理快报。

N.SATO,S.IIZUKA: "Effects of electoron temperature control on an Ar-CH_4 plasma" Proc.of the Inter.Seminor on Reactive Plasmas.1. 371-376 (1991)

N.SATO,S.IIZUKA：“电子温度控制对 Ar-CH_4 等离子体的影响”Proc.of the Inter.Seminor on Reactive Plasmas.1。