Mild routes to bulk boron nitride and molecular oxoboranes

生产批量氮化硼和分子氧硼烷的温和途径

• 批准号: 497540932
• 负责人: Dr. Tanja Kunz
• 金额: --
• 依托单位: Department of Chemistry
• 依托单位国家: 德国
• 项目类别: WBP Fellowship
• 财政年份: 2022
• 资助国家: 德国
• 起止时间: 2021-12-31 至 2022-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/497540932?language=en
• 关键词: Mild; routes; bulk; boron; nitride

The aim of this project is to find a mild route to bulk boron nitride and molecular oxoboranes. Boron nitride has the potential to be a key material in modern computing as a result of its outstanding electrical insulating and heat-conducting properties and its chemical and thermal inertness. The syntheses of boron nitride generally require temperatures above 1500°C, making these methods incompatible with standard device fabrication protocols. The proposed program includes a low-temperature polymer-mediated route to bulk boron nitride and is built upon a series of known transformations. Monomeric oxoboranes (RBO; R = organic group or H) are only observed in the gas phase at high temperatures. The highly reactive triple bond between boron and oxygen generally leads to cyclooligomerization at temperatures higher than 50 K. A second goal of this program is the kinetic stabilization of monomeric oxoborane by bulky N-heterocyclic olefin ligands, which were shown to be useful in the context of low coordinate main group chemistry. If a kinetically stabilized monomeric oxoborane is obtained, the oxoborane will be explored for its ability to promote C-F bond activation and eventually hydrodefluorination catalysis in the presence of silanes.

该项目的目的是找到一条生产块状氮化硼和分子氧硼烷的温和途径，氮化硼由于其出色的电绝缘和导热性能及其化学和热性能而有可能成为现代计算中的关键材料。氮化硼的合成通常需要 1500°C 以上的温度，这使得这些方法与标准器件制造方案不兼容。块体氮化硼是基于一系列已知的单体氧硼烷（RBO；R = 有机基团或 H），仅在高温下在气相中观察到硼和氧之间的高反应性三键通常会导致低聚环化。温度高于 50 K。该计划的第二个目标是通过庞大的 N-杂环烯烃配体实现单体氧硼烷的动力学稳定，这被证明可用于如果获得了动力学稳定的单体氧硼烷，则将探索该氧硼烷在硅烷存在下促进 C-F 键活化和最终加氢脱氟催化的能力。