Diagnostics of Gas-Phase and Surface Reactions of Atomic Radicals in Processing Plasmas by Vacuum Ultraviolet Laser Spectroscopy

真空紫外激光光谱诊断等离子体处理中原子自由基的气相和表面反应

基本信息

批准号：
13480126
负责人：
TACHIBANA Kunihide
金额：
$ 9.6万
依托单位：
KYOTO UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
2001
资助国家：
日本
起止时间：
2001 至 2002
项目状态：
已结题

项目摘要

Atomic species such as H, C, N, F and Cl play important roles in gas-phase and surface reactions for various kinds of plasma material processing. In this project, we have developed a tunable VUV (vacuum ultra-violet) laser absorption spectroscopy system in the range from 800 to 1700 nm by using the two-photon resonant four-wave mixing method (ν_<VUV> = 2ν_1 + ν_2), and applied it to the diagnostics of those species in order to make clear the reaction mechanisms and obtain the guiding principles for the process control.Following the quantitative measurement on F atoms, we applied the VUV absorption method Successfully to the measurement of C atoms in various kinds of fluorocarbon gas plasmas. The obtained results were analyzed for the role of C atoms in the etching of SiO_2 (see the paper published in J. Appl. Phys for more details). Then, we proceeded to the measurement of O atoms for better understandings of photo-resist ashing and Si oxidation processes.For the measurements of H and N atoms, the wavelengths corresponding to ν_1 and ν_2 become 210 and 800 - 900 nm, respectively, for the VUV generation around 120 nm. Therefore, We have modified the laser system by substituting the pumping excimer laser with a YAG-laser for the better VUV conversion efficiency. As the result, we have succeeded in the measurement of H atoms in H_2 and CH_4 gases, and are continuing the quantitative measurement in the processing plasmas for the surface cleaning and diamond-like carbon deposition.

H、C、N、F 和 Cl 等原子种类在各种等离子体材料加工的气相和表面反应中发挥着重要作用。在该项目中，我们开发了可调谐 VUV（真空紫外）激光吸收光谱。采用双光子谐振四波混频方法（ν_<VUV> = 2ν_1 + ν_2）在800~1700 nm范围内建立了系统，并将其应用于继对F原子进行定量测量后，我们将VUV吸收法成功应用于各种氟碳气体等离子体中C原子的测量所获得的结果分析了C原子在SiO_2蚀刻中的作用（更多详细信息，请参阅J. Appl. Phys上发表的论文），然后，我们继续测量O原子以更好地理解。对于H和N原子的测量，对于120 nm左右的VUV产生，对应于ν_1和ν_2的波长分别变为210和800 - 900 nm，因此，我们对激光器进行了修改。通过用 YAG 激光器代替泵浦准分子激光器来获得更好的 VUV 转换效率，我们成功地测量了 H 原子。在H_2和CH_4气体中进行研究，并继续在处理等离子体中进行表面清洁和类金刚石碳沉积的定量测量。