Diagnostics of Gas-Phase and Surface Reactions of Atomic Radicals in Processing Plasmas by Vacuum Ultraviolet Laser Spectroscopy

真空紫外激光光谱诊断等离子体处理中原子自由基的气相和表面反应

基本信息

批准号：
13480126
负责人：
TACHIBANA Kunihide
金额：
$ 9.6万
依托单位：
KYOTO UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
2001
资助国家：
日本
起止时间：
2001 至 2002
项目状态：
已结题

项目摘要

Atomic species such as H, C, N, F and Cl play important roles in gas-phase and surface reactions for various kinds of plasma material processing. In this project, we have developed a tunable VUV (vacuum ultra-violet) laser absorption spectroscopy system in the range from 800 to 1700 nm by using the two-photon resonant four-wave mixing method (ν_<VUV> = 2ν_1 + ν_2), and applied it to the diagnostics of those species in order to make clear the reaction mechanisms and obtain the guiding principles for the process control.Following the quantitative measurement on F atoms, we applied the VUV absorption method Successfully to the measurement of C atoms in various kinds of fluorocarbon gas plasmas. The obtained results were analyzed for the role of C atoms in the etching of SiO_2 (see the paper published in J. Appl. Phys for more details). Then, we proceeded to the measurement of O atoms for better understandings of photo-resist ashing and Si oxidation processes.For the measurements of H and N atoms, the wavelengths corresponding to ν_1 and ν_2 become 210 and 800 - 900 nm, respectively, for the VUV generation around 120 nm. Therefore, We have modified the laser system by substituting the pumping excimer laser with a YAG-laser for the better VUV conversion efficiency. As the result, we have succeeded in the measurement of H atoms in H_2 and CH_4 gases, and are continuing the quantitative measurement in the processing plasmas for the surface cleaning and diamond-like carbon deposition.

H，C，N，F和CL等原子种类在气相和表面反应中起重要作用，用于各种血浆材料加工。在这个项目中，我们通过使用两光子共振的四波混合方法（ν_<vuv> =2ν_1 +ν_2），在800至1700 nm的范围内开发了一种可调的VUV（真空超紫）激光吸收光谱系统，并使该物种在阶段中进行了诊断，并将其应用于阶段的诊断，并将其应用于阶段的诊断。控制FORMONS在F原子上的定量测量，我们成功地将VUV抽象方法应用于各种氟化碳气体等离子体中的CAR原子的测量。对获得的结果分析了CAR原子在SIO_2蚀刻中的作用（有关更多详细信息，请参见J.Appl。Phys上发表的论文）。然后，我们进行了O原子的测量，以更好地理解光抗性的渗透和Si氧化过程。对于H和N原子的测量，对于VUV生成了120 nm，分别对应于ν_1和ν_2的波长分别成为210和800-900 nm。因此，我们通过用YAG-LASER代替泵浦准分子激光器来修改激光系统，以提高VUV转换效率。结果，我们成功地测量了H_2和CH_4气体中H原子的测量，并正在继续在加工平原上的定量测量，用于表面清洁和钻石样碳沉积。