Microfabricated synthetic ferrimagnetic elements and their application to high density memory devices

微加工合成亚铁磁元件及其在高密度存储器件中的应用

• 批准号: 13450126
• 负责人: TSUNASHIMA Shigeru
• 金额: $ 9.79万
• 依托单位: Nagoya University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-13450126/
• 关键词: synthetic ferrimagnet; microfabrication; antiferromagnetic film; focused ion beam; magnetic random access memory; exchange coupling; magnetic imaging; スピン偏極電気伝導; スピントンネル接合; スピンバルブ; ブロッキング温度; 交換異方性

Synthetic ferrimagnetic films and exchange biased bilayers were microfabricated by focused ion beam, and their magnetic domain structures were imaged by magnetic force microscopy. In addition, imaging technique using magnetic X-ray microscope was investigated.(1) NiFe/Ru/NiFe synthetic ferrimagnetic films were prepared by magnetron sputtering and their magnetic properties were measured. Sufficient antiferromagnetic coupling was confirmed to obtained by optimizing the sputtering condition.(2) Square, rectangular, and ellipsoid magnetic elements were fabricated by focused Ga^+ ion beam having 〜100 nm diameter. Closure domain structure was observed for the squared NiFe(12 nm)/Ru(0.3 nm)/NiFe(10 nm) elements, and single domain structure was obtained in the 1:3 rectangular and ellipsoid elements. The dependence of the domain structure on the film construction was also investigated.(3) Domain structure recorded by a magnetic field modulation method on the magneto-optical recording media was imaged by using transmission X-ray microscope. The small marks less than 100 nm lengths were found to be clearly imaged by using X-ray microscope. The dependence of the minimum mark length on the film composition was also investigated. The experimental results were found to be explained by the simulation based on Huth's model.

采用聚焦离子束微加工合成亚铁磁薄膜和交换偏置双层，并通过磁力显微镜对其磁畴结构进行成像，并研究了磁X射线显微镜成像技术。(1) NiFe/Ru/NiFe合成亚铁磁。通过磁控溅射制备薄膜并测量其磁性能，证实通过优化溅射可以获得足够的反铁磁耦合。 (2)通过直径约100 nm的聚焦Ga^+离子束制备方形、矩形和椭圆形磁性元件，观察方形NiFe(12 nm)/Ru(0.3 nm)/NiFe(的闭合域结构。 (3) 域结构通过使用透射X射线显微镜对通过磁场调制方法记录在磁光记录介质上的小标记进行成像，发现使用X射线显微镜可以清晰地成像。还研究了标记长度对薄膜成分的影响，发现实验结果可以通过基于休斯模型的模拟来解释。

项目成果

T.Kato: "Magnetic properties of polycrystalline and epitaxial Cr_1-x>Mn_xPt_3 alloy films"IEEE Trans.Magn.. 37-4. 2414-2416 (2001)

T.Kato：“多晶和外延Cr_1-x>Mn_xPt_3合金薄膜的磁性”IEEE Trans.Magn. 37-4。

T.Kato: "Magnetic domain structure of NiFe and MnIrINiFe elements patterned by focused ion beam"Jpn.J.Appl.Phys.. 41-10A. L1078-L1080 (2002)

T.Kato：“通过聚焦离子束图案化的 NiFe 和 MnIrINiFe 元素的磁畴结构”Jpn.J.Appl.Phys.. 41-10A。

T.Koyama et al.: "Simulation of thermomagnetic recording process using magnetic field modulation method"Trans.Magn.Soc.Jpn.. Vol.2 No.4. 271-272 (2002)

T.Koyama等人：“使用磁场调制方法的热磁记录过程的模拟”Trans.Magn.Soc.Jpn..Vol.2 No.4。

T.Kume et al.: "Exchange anisotropy in epitaxial Mn_<1-x>Pt_<x/>NiFe bilayers"IEEE Trans.Magn.. Vol.38 No.5. 2785-2787 (2002)

T.Kume 等人：“外延 Mn_<1-x>Pt_<x/>NiFe 双层中的交换各向异性”IEEE Trans.Magn.. Vol.38 No.5。

T.Kato: "Magnetic Circular Dichroism of Polycrystalline (Mn_<1-x>Cr_x)Pt_3 and Epitaxial CrPt_3 Alloy Films"Trans. Magn. Soc. Jpn.. 2-2. 98-103 (2002)

T.Kato：“多晶(Mn_<1-x>Cr_x)Pt_3和外延CrPt_3合金薄膜的磁圆二色性”Trans。