Fabricatio of Photonic Devices Using Photosensitive Gel Films and Their Properties

光敏凝胶薄膜光子器件的制备及其性能

基本信息

批准号：
12555179
负责人：
TOHGE Noboru
金额：
$ 3.58万
依托单位：
Kinki University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
2000
资助国家：
日本
起止时间：
2000 至 2001
项目状态：
已结题

项目摘要

1)Fabrication of PZT Films on ITO-Coated Substrate by the Chemical Modification Method : PZT films were fabricated on ITO-coated silica glass stubstrates by the chemical modification method and their electrical properties were studied. The properties of the PZT films fabricated were found depend on the oxygen partial pressure when ITO films had been prepared by RF magnetron sputtering.2)Preparation of Photosensitive Gel Films Containing Eu^<3+> : Luminescent patterns could be fabricated by UV-irradiation and leaching for the photosensitive gel films containing Eu^<3+>. Correlation between luminescent properties and using matrix were also discussed.3)Fabrication of Two-Dimensional Gratings and Their Antireflection Effects : Two-dimensional (2D) surface-relief gratings have been fabricated by the two-beam interference method on photosensitive gel films. The formation of 2D-grating of island type on a silica glass substrate substantially reduced the reflection at its surface in a waveleng … More th range of 1.3 to 2.6 mm.4)Effects of Methacrylic Acid on the Photosensitivity of Chemically Modified Gel Films : It has been found that the photosensitive gel films obtained from Zr-alkoxide modified with β-diketone and methacrylic acid can be thicker than the gel films without methacrylic acid.5)Preparation of Photosensitive ZrO_2 Gel Films Using Hydroxyl-sustituted Aromatic Ketones : In order to develop new photosensitive gel films, ZrO_2 gel films were prepared from zirconlum butoxide chemically modified with hydroxyl-substituted aromatic ketones by the sol-gel method. The gel film obtained absorbed light at around 400 nm. For the gel films, line and circle patterns could be fabricated by He-Cd laser beam irradiation.6)Selective Coloration of Photosensitive ZrO_2 Gel Films : A selective coloration process has been newly developed utilizing photosensitive gel films. The dye-containing SiO_2 gel film on the unirradiated part of the ZrO_2 gel film remained, while that on the irradiated part was removed upon rinsing.7)Optical Absorption and Electronic State of Chemically Modified Ti-Alkoxides : Electronic state of titanium alkoxides stabilized with β-diketones which had various substituents was calculated by the DV-X α cluster method. The origin of the optical absorption and the mechanism of the decomposition reaction of alkoxides with irradiation of light were discussed. Less

1）通过化学修饰方法在ITO涂层的底物上制造PZT膜：通过化学修饰方法在ITO涂层的二氧化硅玻璃垫上制造PZT膜，其电气性能是研究的。发现所制造的PZT膜的特性取决于当ITO膜通过RF磁性溅射制备ITO膜时的氧部分压力。2）制备含有Eu^<3+>的光敏凝胶膜：可以通过uv-irradiation制造的发光图案，并由uv-irradiation和含有含有eu^eu^eu^eu^<3 ever的Photosimentimenty photosimentiation for for uv-irradiation和行走。还讨论了发光特性与使用矩阵之间的相关性。3）制造二维光栅及其反反射效果：通过对光敏凝胶膜的两光束干扰方法制造了二维（2D）表面浮雕光栅。 The formation of 2D-gating of island type on a silica glass substrate substantially reduced the reflection at its surface in a wavelen … More th range of 1.3 to 2.6 mm.4) Effects of Methacrylic Acid on the Photosensitivity of Chemically Modified Gel Films: It has been found that the photosensitive gel films obtained from Zr-alkoxide modified with β-diketone and methacrylic acid can be thicker than the gel 5）使用羟基固定的芳香族酮制备光敏性Zro_2凝胶膜的制备：为了开发新的光敏凝胶膜，用氧化二氧化二酚胶片制备了用羟基化的氧化酚胶片，该胶片是用羟基化的溶剂化合物用羟基固定的芳族溶质蛋白通过溶剂化的溶质蛋白来制备的。凝胶膜在约400 nm处获得吸收的光。对于凝胶膜，可以通过HE-CD激光束照射来制造线条和圆形图案。6）光敏Zro_2凝胶胶片的选择性色彩：使用光敏凝胶膜的新开发了选择性的着色过程。在Zro_2凝胶膜的未辐照部分上含有染料的SIO_2凝胶膜，而在冲洗后将其上除去了辐照部分的胶片。讨论了光学吸收的起源和烷氧化物对光照射的分解反应的机理。较少的