Establishment of Ceramic Coating System for Improving Resisting Function of Thin Film Coating from the Environmental Attack

提高薄膜涂层抗环境侵蚀性能的陶瓷涂层体系的建立

基本信息

批准号：
11450048
负责人：
KIMURA Yuji
金额：
$ 6.85万
依托单位：
Kogakuin UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B).
财政年份：
1999
资助国家：
日本
起止时间：
1999 至 2000
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-11450048/
关键词：
CVD ＆ IM coatings Corrosion resistance EAFM in situ observation Corrosion behavior Electrochemical measurement CPCD method Pinhole defect ratio Adhesion strength

项目摘要

Thin film coatings toward various types of materials such as metal and organic compound have been used for protecting substrate surface from harsh environment or adding a lot of functions to them. However, nanometric defects and cracks were always existed in coated thin film from the initial stage. In actual environment, degradation was generated as a result of the corrosive solution going into substrate through the nanometric defect of coating. Therefore, various investigations were conducted from the view points of (a) improvement of corrosion resistance of substrate metal through N^+ ion implantation, (b) Improvement of adhesion strength by optimizing thin film formation condition by Dynamic Ion Mixing (DIM) method and (c) protection of thin film coated specimen from corrosion by photo-catalytic effect of coated TiO_2 film.Results obtained are summarized as follows ;(1) The adhesion characteristic of TiN films, which was coated by plasma CVD, was investigated by the scratch test. Th … More en, through investigating the relationship between temperature condition of TiN film formation and critical load of Lc obtained by scratch test, the adhesive strength between TiN film and substrate was evaluated. Also, through evaluating the substrate materials dependency upon adhesive strength, the applicable range of the CPCD test was made clear for the defect ratio evaluation of TiN films with various film thickness and adhesion strength. In addition, some improvements in CPCD test method for avoiding the overestimation of defect in film were discussed.(2) Because of the better understanding of correlation between localized corrosion progress and defect morphology of thin film coating, in situ observation in aqueous solution together with electrochemical measurement was needed. Therefore, in situ observation of defect morphology and nm or μm orders localized corrosion generated in 3% NaCl aqueous solution was conducted by Electrochemical Atomic Force Microscopy (EAFM) newly established by present authors.(3) Formation and characterization of TiO_2 thin film made on 304 stainless steel by Ion-beam-mixing method were conducted. Therefore, TiO_2 thin film made by Ion-beam-mixing method have superior adhesive characteristics and graded microstructure. Then, examination of the compositions and crystal structure of deposited thin films were conducted by XRD and ESCA.And also, it was confirmed that the 0.15mm thick TiO_2 thin film could have cathodic protection performance in 0.3wt% NaCl aqueous solution at room temperature. Less

针对金属和有机化合物等各种材料的薄膜涂层已被用于保护基材表面免受恶劣环境的影响或为其添加许多功能，但涂层薄膜从一开始就一直存在纳米缺陷和裂纹。在实际环境中，由于腐蚀溶液通过涂层的纳米缺陷进入基材而产生降解，因此，从(a)通过N^+离子提高基材金属的耐腐蚀性的角度进行了各种研究。植入，(b) 改善通过动态离子混合（DIM）方法优化薄膜形成条件来总结粘附强度，以及（c）通过涂覆的TiO_2薄膜的光催化作用保护薄膜涂覆样品免受腐蚀。获得的结果如下；（1）通过划痕试验，通过研究TiN膜形成温度条件与所得Lc临界载荷之间的关系，研究了等离子CVD沉积的TiN膜的附着特性。通过划痕测试，评估了TiN薄膜与基底之间的粘合强度。此外，通过评估基底材料对粘合强度的依赖性，明确了CPCD测试的适用范围，以评估不同膜厚和厚度的TiN薄膜的缺陷率。此外，还讨论了CPCD测试方法的一些改进，以避免高估薄膜中的缺陷。(2)由于对薄膜涂层局部腐蚀进展与缺陷形貌之间的相关性有了更好的理解，因此在水溶液中进行了原位观察。解决方案与因此，利用本作者新建立的电化学原子力显微镜（EAFM）对缺陷形貌和在3% NaCl水溶液中产生的纳米或微米级局部腐蚀进行了原位观察。（3）缺陷的形成和表征。采用离子束混合法在304不锈钢上制备TiO_2薄膜，表明离子束混合法制备的TiO_2薄膜具有优异的附着性能和分级性。然后，通过XRD和ESCA对沉积薄膜的成分和晶体结构进行了研究，并证实了0.15mm厚的TiO_2薄膜在室温下的0.3wt% NaCl水溶液中具有阴极保护性能。温度.更少