Establishment of Ceramic Coating System for Improving Resisting Function of Thin Film Coating from the Environmental Attack

提高薄膜涂层抗环境侵蚀性能的陶瓷涂层体系的建立

基本信息

批准号：
11450048
负责人：
KIMURA Yuji
金额：
$ 6.85万
依托单位：
Kogakuin UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B).
财政年份：
1999
资助国家：
日本
起止时间：
1999 至 2000
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-11450048/
关键词：
CVD ＆ IM coatings Corrosion resistance EAFM in situ observation Corrosion behavior Electrochemical measurement CPCD method Pinhole defect ratio Adhesion strength

项目摘要

Thin film coatings toward various types of materials such as metal and organic compound have been used for protecting substrate surface from harsh environment or adding a lot of functions to them. However, nanometric defects and cracks were always existed in coated thin film from the initial stage. In actual environment, degradation was generated as a result of the corrosive solution going into substrate through the nanometric defect of coating. Therefore, various investigations were conducted from the view points of (a) improvement of corrosion resistance of substrate metal through N^+ ion implantation, (b) Improvement of adhesion strength by optimizing thin film formation condition by Dynamic Ion Mixing (DIM) method and (c) protection of thin film coated specimen from corrosion by photo-catalytic effect of coated TiO_2 film.Results obtained are summarized as follows ;(1) The adhesion characteristic of TiN films, which was coated by plasma CVD, was investigated by the scratch test. Th … More en, through investigating the relationship between temperature condition of TiN film formation and critical load of Lc obtained by scratch test, the adhesive strength between TiN film and substrate was evaluated. Also, through evaluating the substrate materials dependency upon adhesive strength, the applicable range of the CPCD test was made clear for the defect ratio evaluation of TiN films with various film thickness and adhesion strength. In addition, some improvements in CPCD test method for avoiding the overestimation of defect in film were discussed.(2) Because of the better understanding of correlation between localized corrosion progress and defect morphology of thin film coating, in situ observation in aqueous solution together with electrochemical measurement was needed. Therefore, in situ observation of defect morphology and nm or μm orders localized corrosion generated in 3% NaCl aqueous solution was conducted by Electrochemical Atomic Force Microscopy (EAFM) newly established by present authors.(3) Formation and characterization of TiO_2 thin film made on 304 stainless steel by Ion-beam-mixing method were conducted. Therefore, TiO_2 thin film made by Ion-beam-mixing method have superior adhesive characteristics and graded microstructure. Then, examination of the compositions and crystal structure of deposited thin films were conducted by XRD and ESCA.And also, it was confirmed that the 0.15mm thick TiO_2 thin film could have cathodic protection performance in 0.3wt% NaCl aqueous solution at room temperature. Less

薄膜涂层针对各种类型的材料（例如金属和有机化合物）已用于保护底物表面免受HARMSH环境的影响或向其添加许多功能。然而，从初始阶段开始，涂层薄膜中始终存在纳米缺陷和裂纹。在实际环境中，由于涂层的纳米缺陷进入底物，产生了降解。因此，从（a）通过N^+离子植入来改善底物金属耐腐蚀性的观点进行了各种研究锡膜的粘合剂特征是由等离子体CVD覆盖的，通过刮擦测试进行了研究。通过研究锡膜形成的温度条件与通过刮擦测试获得的LC的临界负载之间的关系，评估了锡膜和底物之间的粘合强度。同样，通过评估，底物材料依赖于粘合强度，对于具有各种膜厚度和粘合强度的TIN膜的缺陷比评估，CPCD测试的适用范围清楚了。此外，讨论了CPCD测试方法的一些改进，以避免膜中的缺陷过度估计。（2）由于需要更好地理解局部腐蚀进度与薄膜涂层的缺陷形态之间的相关性，因此需要与水溶液中的原位观察到与电化学测量的相关性。因此，原位观察缺陷形态和NM或μM订单在3％NaCl水溶液中产生的局部腐蚀是通过现代作者新建立的电化学原子力显微镜（EAFM）进行的。（3）Tio_2薄膜的形成和表征是由304层由304个薄膜通过Ion-ion-beam-beam-mixs-mixs-Mixsing soding condosity condosity condosity condosity condosity。因此，由离子束混合方法制造的TIO_2薄膜具有优越的粘合特性和分级的微观结构。然后，通过XRD和ESCA对沉积薄膜的组成和晶体结构进行检查。此外，还可以证实，在室温下，0.15mm厚的TIO_2薄膜可以在0.3wt％NACL水溶液中具有阴极保护性能。较少的