Next Generation Debris-Free EUV Source using Fast Z-pinch Discharge in Cylindrical Gas Curtain

在圆柱形气幕中使用快速 Z 箍缩放电的下一代无碎片 EUV 源

基本信息

批准号：
17206025
负责人：
HOTTA Eiki
金额：
$ 32.36万
依托单位：
Tokyo Institute of Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A)
财政年份：
2005
资助国家：
日本
起止时间：
2005 至 2007
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-17206025/
关键词：
Debris free EUV light source Coaxial double nozzle Z-pinch Gas curtain Plasma dynamics Diffuser MPC circuit デイフューザー色素レーザ

项目摘要

To develop a next generation debris-free extreme ultraviolet (EUV) source with high quality and high output power, the objectives of this study were decided as follows: 1. increase energy conversion efficiency from electrical energy storage to EUV emission, 2. suppress the debris generation, 3. develop a debris shield, which does not interfere the discharge gas flow, to mitigate the debris that cannot be removed by the above mentioned method.Since the usual Z-pinch discharge head employs an insulating wall, debris is generated from the wall material. Therefore, in order to prevent the debris from generating, the insulating wall has been removed and the EUV has been intended to be collected in the radial direction. Using a spectrometer, suppression of debris generation was confirmed from the remarkable reduction of impurity lines. In addition, the specially designed cylindrical gas curtain was found to have a discharge gas confinement function, which was not supposed at first.The stray … More inductance of the former device was very large and it was impossible to get large discharge current. Then, the circuit design was re-examined. To reduce the stray inductance in the final stage of discharge circuit as much as possible, an LC inversion generator and a two-stage magnetic pulse compression (MPC) circuit have been adopted. Experimentally obtained current has the amplitude of 22 kA and the pulse width of 260 ns for short-circuit. Moreover, to increase the conversion efficiency from the electrical input to EUV emission, a device which generates a plasma jet by using RF discharge was set.According to the original plan, Z-pinch discharge was tried using the RF preionized plasma jet. As a result, it was found that in case of using RF preionized jet since the chamber was filled with weakly ionized plasma and discharge occurred at other place other than the plasma jet. Therefore, no Z-pinch plasma could be obtained in this case. To keep the inside of chamber high vacuum, using the turbo molecular pump to evacuate the chamber instead of using it for the diffuser, we are now trying to improve the vacuum state in the chamber. Less

要开发具有高质量和高输出功率的下一代无垃圾溢油液（EUV）来源：1。提高能量转换功效，从电能储存到EUV发射，2。抑制碎屑生成3。，碎屑屏蔽了排放气流，以减轻无法超过tioned方法的碎屑。从通常的Z-Pinch排放头部使用隔热墙，从墙壁上产生了dewris，从墙壁上产生了朝向径向沿径向方向进行bec teed的墙壁。。很大，当时不可能获得大量排放炉电，重新审查了盘中电路的杂物电感。已经获得的实验。使用RESMA射流进行Z-PINCH射出，以防万一RF预防射流，腔室中填充了弱易于的等离子体，而盘则是脱落的位置。在这种情况下，血浆可以使室内疏散室内，而不是将其用于扩散器，我们现在正在尝试改善腔室中的真空状态

项目成果

期刊论文数量（121）

专著数量（0）

科研奖励数量（0）

会议论文数量（0）

专利数量（0）

Development of Debris-Free EUV Source using Gas Jet Z-pinch Plasma

使用气体喷射 Z 箍缩等离子体开发无碎片 EUV 源

DOI：
发表时间：
2006
期刊：
影响因子：
0
作者：
Masato;Watanabe
通讯作者：
Watanabe

東工大における高品位DPP光源開発

东京工业大学的高质量 DPP 光源开发

DOI：
发表时间：
2006
期刊：
影响因子：
0
作者：
Shoyo Hyodo;Ryogo Kubo;Kouhei Ohnshi;堀田栄喜
通讯作者：
堀田栄喜

極端紫外光(EUV)の絶対計測

极紫外光（EUV）的绝对测量

DOI：
发表时间：
2007
期刊：
平成18年度共同研究成果報告書, 大阪大学レーザーエネルギー学研究センター
影响因子：
0
作者：
飯塚直哉;岸望;姜飛;沖野晃俊;渡辺正人;堀岡一彦;堀田栄喜
通讯作者：
堀田栄喜

Ling Pulse EUV Source using Magnetically Guided Discharge Plasma

使用磁导放电等离子体的 Ling 脉冲 EUV 源

DOI：
发表时间：
2007
期刊：
IEEJ Technical Meeting on Pulsed Power Technology PPT-07-45
影响因子：
0
作者：
Ken;Terada;Mitsuo;Nakajima;Tohru;Kawamura;Tomoaki;Hosokai;Eiki;Hotta;Kazuhiko;Horioka
通讯作者：
Horioka

Z-ピンチ型放電プラズマEUV光源の研究

Z箍缩放电等离子体EUV光源研究