Surface Analysisi under Air by UV Photoelectron Yield Spectroscopy

空气下紫外光电子产率光谱分析

• 批准号: 04640552
• 负责人: MONJUSHIRO Hideaki
• 金额: $ 1.28万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1992
• 资助国家: 日本
• 起止时间: 1992 至 1993
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-04640552/
• 关键词: Photoelectron Emission; Work Function; Surface Anlysis; chemical Modification; Semiconductors

Ultraviolet photoelectron Yield spectroscopy (UPYS) is a new tool to investigate the surface property of the solid sampke under air atmosphere. In this study, the UPY spectra of semiconducters and surface modified gold metal were measured and andlyzed to elucidate the ability of this techniquw as surface analytical technique in air.The photoelectron threshold energy, Et of the various types of silicon wafers were determined form the UPY spectra. The Et and photoelectron Yield, Y reflect the nature of the surface electronic band structre and are sensitive to the type of the inpurity and its concentration. It is also indicated that the (111) and (100) faces of the silicon wafers can be easily distinguished by the use of derivative of th eUPY spectra.The escape depth of th every low energy electrons in hydrocarbon layr was determined to be about 11A by measuring the UPY spectra of alkane thiol modified gold metals. This value is vomparable or smaller than that for photoelectron neasured in XPS, indicating that the UPYS is very sensitive to the suface of the sample. The Et for the functinally modified gold metal reflects the dipole amplitude and its orientation of the surface functional group.

紫外光照射光谱（UPYS）是研究空气大气下固体sampke的表面特性的新工具。在这项研究中，测量并进行了溶解的分子，并阐明了该技术作为空气中的表面分析技术的能力。光电子阈值能量等各种类型的硅晶片的ET形成了Upy光谱。 ET和光电子的产量，y反映了表面电子带的性质，并且对耐心的类型及其浓度敏感。还表明，硅晶片的（111）和（100）面可以通过使用衍生物的使用来区分。该值比在XPS中的光电子杀手的光电子甲呈呕吐或小，表明UPYS对样品的SUFACE非常敏感。功能修饰的金属的ET反映了偶极振幅及其表面官能团的方向。

项目成果

Shigemi Kohiki: "Ultraviolet Photoelectron Yield Spectroscopy of Chalcopyrite Structure Cu-In-Se Thin Films." Thin Solid Films. 238. 195-198 (1994)

Shigemi Kohiki：“黄铜矿结构 Cu-In-Se 薄膜的紫外光电子产率光谱。”

Shigemi Hohoki: "UV Photoelectron Yield Spectroscopy of Chalcopyrite Structure Cu-In-Se Thin Films" Thin Solid Films. vol.238. 195-198 (1994)

Shigemi Hohoki：“黄铜矿结构 Cu-In-Se 薄膜的紫外光电子产率光谱”固体薄膜。

Shigemi Kohiki: "UV Photoelectron Yield Spectroscopy of Chalcopyrite Structure Cu-In-Se Thin Films." Thin Solid Films. 238. 195-198 (1994)

Shigemi Kohiki：“黄铜矿结构 Cu-In-Se 薄膜的紫外光电子产率光谱。”