Surface Reaction Dynamics Studied by Hot-atom Beams

热原子束研究的表面反应动力学

• 批准号: 06453030
• 负责人: MATSUMOTO Yoshiyasu
• 金额: $ 0.64万
• 依托单位: Okazaki National Research Institute
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06453030/
• 关键词: Hot atom; Surdace Reaction; Platinum; Exchange reaction; Recombination; Photodissociation; 表面光化学

1. Excitation mechanism for photochemistry of methane on Pt (111).Methane adsorbed on Pt (111) surface is dissociated with 193 nm photons. The excitation mechanism was investigated by cross section measurements with a fixed polarization of laser as a function of incident angles. We found that direct excitation plays an important role.2. Photo-induced recombination reaction between hot H atoms and methyl adsorbates.Energetic hydrogen atoms produced via photodissociation of methane on Pt (111) further react with pre-adsorbed methyl to form methane before they dissipate energy to the bulk.3. Dynamics of the thermally induced recombination reaction between H and CH_3.Recombination reaction between hydrogen and methyl adsorbates on Pt (111) was investigated by pulse heating and TOF measurements. Methane produced by this reaction desorbs with the average kinetic energy of 0.43 eV.The angular distribution of methane is quite sharp along the surface normal. The obtained results were compared with the predictions of a model based on RRKM theory.

1. Pt(111) 上甲烷光化学的激发机制。吸附在 Pt(111) 表面的甲烷被 193 nm 光子解离。通过使用固定激光偏振作为入射角的函数的横截面测量来研究激发机制。我们发现直接激励起着重要的作用。2．热H原子和甲基吸附物之间的光诱导重组反应。甲烷在Pt（111）上光解产生的高能氢原子进一步与预吸附的甲基反应形成甲烷，然后将能量耗散到本体中。3． H 和 CH_3 之间热诱导复合反应的动力学。通过脉冲加热和 TOF 测量研究了 Pt (111) 上氢和甲基吸附物之间的复合反应。该反应产生的甲烷以0.43 eV的平均动能解吸。甲烷沿表面法线的角度分布非常尖锐。将所得结果与基于 RRKM 理论的模型的预测进行了比较。

项目成果

Y. A. Gruzdkov: "Photochemical C-H bond activation of methanecna Pt(111)surface" Chem. Phys. Lett.227. 243-247 (1994)

Y. A. Gruzdkov：“甲烷 Pt(111) 表面的光化学 C-H 键活化” Chem。

J.Lee, H.Kato, K.Sawabe, and Y.Matsumoto: "Angular distributions of N_2 in photodissociation of N_2O adsorbed on a partially oxidized Si (100) surface at 95K" Chemical Physics Letters. 240. 417-422 (1995)

J.Lee、H.Kato、K.Sawabe 和 Y.Matsumoto：“95K 时吸附在部分氧化的 Si (100) 表面上的 N_2O 光解中 N_2 的角分布”《化学物理快报》。

H.kato: "Adsorbed states and thermal reactions of N_2O on Si (100) belew room temperature : Desorption induced by dissociation" Surface Science. (印刷中). (1996)

H.kato：“室温以下 N_2O 在 Si (100) 上的吸附状态和热反应：解离引起的解吸”（出版中）。

H. Kato: "Adsorbed states and thermal reactions of N_2O on Si(100) beleiroom temperature:Desorption induced by dissociation" Surface Science. (印刷中). (1996)

H. Kato：“Si(100) 室温下 N_2O 的吸附状态和热反应：解离引起的解吸”（出版中）。

J. Lee: "Angular distributions of N_2 in photodissociation of N_2O adsorbed on a partially oxidized Si(100) surface at 95K" Chem. Phys. Lett.240. 417-422 (1995)

J. Lee：“95K 时吸附在部分氧化的 Si(100) 表面上的 N_2O 光解中 N_2 的角分布” Chem.