Microscopic analysis on surface reaction induced by laser irradiation and its application to atomic layr epitaxy

激光辐照引起的表面反应的显微分析及其在原子层外延中的应用

基本信息

  • 批准号:
    06452111
  • 负责人:
  • 金额:
    $ 4.61万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
  • 财政年份:
    1994
  • 资助国家:
    日本
  • 起止时间:
    1994 至 1995
  • 项目状态:
    已结题

项目摘要

Control of GaP growth at the atomic-layr level has been achieved by laser-triggering in metalorganic molecular beam epitaxy (MOMBE) under a simultaneous supply of triethylgallium and thermally cracked PH_3. The growth rate of GaP was enhanced at low substrate temperatures by ultraviolet light emitted from a N_2 laser. The growth rate is controlled by either the TEGa supply between laser pulses or the photon number, and it shows saturation with a high TEGa supply. This suggests that the adsorption of TEGa on a surface saturates.Surface reactions triggered by pulsed laser irradiation for GaP growth were studied with reflection high-energy electron diffraction (RHEED) at a low temperature of 350゚C IN MOMBE.On the laser irradiation, the intensity of RHEED showed an abrupt decrease followed by gradual recovery. The abrupt decrease indicates that adsorbed TEGa on a GaP surface is photo-decomposed by the laser irradiation. The intensity recovery had much dependence on PH_3 flow rate, which indicates that the intensity recovery is related with surface reaction between photo-decomposed TEGa and P atoms. This result shows that the decomposition of TEGa by laser irradiation and the formation of GaP occur alternately under continuous supply of source geses. This opens up a new mode of ALE triggered by laser irradiation without alternate supply of source gases.
通过简单的三乙基gallium和热破裂的pH_3供应,可以通过激光触发金属有机分子束外延(MOMBE)来控制原子 - 莱水平的间隙生长。通过N_2激光发出的紫外线在低底物温度下的间隙增长速率提高。生长速率受激光脉冲或光子数之间的TEGA供应控制,并且显示出较高的TEGA供应。这表明TEGA对表面饱和的吸附。脉冲激光照射触发的间隙生长引起的表面反应在350°C的低温下进行了反射高能电子衍射(RHEED)。突然减少表明在间隙表面上吸附的TEGA是由激光照射对图片进行的。强度恢复对PH_3流量的依赖性很大,这表明强度恢复与照片分解的TEGA和P原子之间的表面反应有关。该结果表明,通过激光照射对TEGA的分解,而间隙的形成也发生在源GES的连续供应下。这打开了一种新的ALE模式,该模式是由激光照射触发的,而无需替代源气体的供应。

项目成果

期刊论文数量(18)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
M. Yoshimoto: "In-situ RHEED observation on surface reactions in laser-triggered chemical beam epitaxy of GaP" Applied Surface Science. 79/80. 227/231 (1994)
M. Yoshimoto:“激光触发化学束外延 GaP 表面反应的原位 RHEED 观察”应用表面科学。
  • DOI:
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    0
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  • 通讯作者:
Hiroyuki Matsunami: "In-situ Reflection High-Energy Electron Diffraction Observation of Laser-Triggered Gap Growth in Chemical Beam Epitaxy" J.Crystal Growth. 136. 89-93 (1994)
Hiroyuki Matsunami:“化学束外延中激光触发间隙生长的原位反射高能电子衍射观察”J.Crystal Growth。
  • DOI:
  • 发表时间:
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  • 影响因子:
    0
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  • 通讯作者:
Hiroyuki Matsunami: "In-situ RHEED Observation on Surface Reactions in Laser-Triggered Chemical Beam Epitaxy of Gap" Appl.Surface Science. 79/80. 227-231 (1994)
Hiroyuki Matsunami:“激光触发化学束间隙外延表面反应的原位 RHEED 观察”Appl.Surface Science。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
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  • 通讯作者:
M. Yoshimoto: "Laser decomposition of surface adsorbed metalorganics in MOMBE" Transaction Materials Research Society, Japan. 19A. 163-166 (1994)
M. Yoshimoto:“MOMBE 中表面吸附金属有机物的激光分解”,日本材料研究学会交易。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
  • 作者:
  • 通讯作者:
M.Yoshimoto: "In-situ RHEED observation on surface reactions in laser-triggered chemical beam epitaxy of GaP" Applied Surface Science. 79/80. 227-231 (1994)
M.Yoshimoto:“激光触发化学束外延 GaP 表面反应的原位 RHEED 观察”应用表面科学。
  • DOI:
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  • 影响因子:
    0
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MATSUNAMI Hiroyuki其他文献

MATSUNAMI Hiroyuki的其他文献

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{{ truncateString('MATSUNAMI Hiroyuki', 18)}}的其他基金

Control of Electronic Properties of Wide Bandgap Semiconductor and Application to Energy Electronics
宽带隙半导体电子特性控制及其在能源电子领域的应用
  • 批准号:
    09102009
  • 财政年份:
    1997
  • 资助金额:
    $ 4.61万
  • 项目类别:
    Grant-in-Aid for Specially Promoted Research
Atomic-Level Control of SiC and Device Applications
SiC 的原子级控制和器件应用
  • 批准号:
    08044143
  • 财政年份:
    1996
  • 资助金额:
    $ 4.61万
  • 项目类别:
    Grant-in-Aid for international Scientific Research
Application of Wide Bandgap Semiconductor SiC for Power Devices
宽禁带半导体SiC在功率器件中的应用
  • 批准号:
    06555095
  • 财政年份:
    1994
  • 资助金额:
    $ 4.61万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research (B)
Electronic Behavior ofWide-Gap Semiconductor and Devices
宽禁带半导体和器件的电子行为
  • 批准号:
    06044115
  • 财政年份:
    1994
  • 资助金额:
    $ 4.61万
  • 项目类别:
    Grant-in-Aid for international Scientific Research
Crystal Growth of Widegap Semiconductor SiC with High-Purity and Application to Power Devices
高纯宽禁带半导体SiC晶体生长及其在功率器件中的应用
  • 批准号:
    04555068
  • 财政年份:
    1992
  • 资助金额:
    $ 4.61万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research (B)
Crystal Growth of High-Quality SiC by Step-Controlled Epitaxy and its Application for Power Devices
步进控制外延高质量SiC晶体生长及其在功率器件中的应用
  • 批准号:
    02555059
  • 财政年份:
    1990
  • 资助金额:
    $ 4.61万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research (B)
Carrier dynamics in amorphous semiconductor superstructures
非晶半导体超结构中的载流子动力学
  • 批准号:
    63460056
  • 财政年份:
    1988
  • 资助金额:
    $ 4.61万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Development of SiC Blue Light-Emitting Diodes Utilizing Step-Controlled Epitaxy
利用步进控制外延技术开发 SiC 蓝色发光二极管
  • 批准号:
    63850060
  • 财政年份:
    1988
  • 资助金额:
    $ 4.61万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research
Low Temperature Epitaxial Growth of Refractory Crystals by Photo-ionization
光电离低温外延生长难熔晶体
  • 批准号:
    59420018
  • 财政年份:
    1984
  • 资助金额:
    $ 4.61万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (A)
Fabrication of active devices using semiconducting SiC for use in heavy environment
使用半导体 SiC 制造用于恶劣环境的有源器件
  • 批准号:
    59850051
  • 财政年份:
    1984
  • 资助金额:
    $ 4.61万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research

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