Secondary Ion Generation Mechanism Studied by Multi-photon Excima Laser Ionization

多光子准激激光电离二次离子产生机理研究

• 批准号: 01460084
• 负责人: SHIMIZU Ryuichi
• 金额: $ 4.03万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1989
• 资助国家: 日本
• 起止时间: 1989 至 1990
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-01460084/
• 关键词: Quantitative Surface Analysis; Multi-photon Ionization; Secondary Ion Mass Spectroscopy; Sputtering; Ion implantation; Surface Binding Energy; エキシマレ-ザ-; 多光子励起イオン化; スパッタ-粒子; 多光子励起; 二次イオン生成; 表面分析

We have succeeded to develop Multi-Photon Ionization System, which enables us to perform quantitative secondary ion mass spectroscopy as well as precise measurement of velocity distribution of sputtered particles. Figure shown below is schematic diagram of the systems. Typical conditions of the manurement are as follows : Laser beam size, 0.9m x 0.3m ; Laser intensity 33mJ, ion be&n 1-3, muA for cleaning and lO-3OnA for the manurement of sputtered particles ; Vacuum lxlO^<-9>Torr.The results are summarized ;(1) Quantitative surface analysis for Al-Cu alloys have indicated that concentration of AI is determined so accurately as C_<A1>=25.4<plus-minus>0.446% for true concentration 26%.(2) This type of quantitative surface analysis can be performed with high stability almost unsensitive to the variation of surface cont&nination and vacuum deterioration.(3) It has, first, bean observed that velocity distribution of sputtered atoms from Cu-Ni alloy under Ar+ ion bonbardment is slightly dependent on the ion dose.(4) The analysis has led to conclusion that the primary Are ions implanted in the surface of Cu-Ni alloy do change the actual surface binding energy, i. e., high dose leads to lower the surface binding energy.

我们成功地开发了多光子电离系统，这使我们能够执行定量的次级离子质谱以及溅射颗粒速度分布的精确测量。下图是系统的示意图。手表的典型条件如下：激光束尺寸，0.9m x 0.3m；激光强度为33MJ，离子BE＆n 1-3，用于清洁和LO-3ONA的MUA，用于手表溅射颗粒；真空lxlo^<-9> torr。总结了结果；（1）al-Cu合金的定量表面分析表明，AI的浓度是如此准确地确定为C_ <a1> = 25.4 <plus-plus-minus> 0.446％，用于0.446％真正的浓度为26％。（2）可以以高稳定性进行这种定量的表面分析，几乎对表面续与nination＆ninination和vacuum降低的变化几乎不敏感。（3）首先，它已经观察到bean观察到溅射原子的速度分布。 -ni合金在AR+离子套件下略有依赖于离子剂量。（4）分析导致结论是，将主要离子植入Cu-Ni合金表面确实改变了实际表面结合能，即。例如，高剂量导致降低表面结合能。

项目成果

E.Kawatoh and R.Shimizu: "Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization.2.A Quantitative Composition Analysis of Cu-Al Alloy" Jpn.J.Appl.Phys.30. 832-836 (1991)

E.Kawatoh 和 R.Shimizu：“通过非共振多光子电离分析溅射中性子。2.铜铝合金的定量成分分析”Jpn.J.Appl.Phys.30。

E.Kawatoh and R.Shimizu: "Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization II.A Quantitative Composition Analysis of CuーAl Alloy" Jpn.J.Appl.Phys.30. (1991)

E. Kawatoh 和 R. Shimizu：“通过非共振多光子电离分析溅射中性子 II.A 铜铝合金的定量成分分析”Jpn.J.Appl.Phys.30 (1991)。

E.Kawatoh and R.Shimizu: "Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization.3.Change of the Velocity Distribution with Time after Sputtering" Jpn.J.Appl.Phys.30. 1256-1261 (1991)

E.Kawatoh 和 R.Shimizu：“通过非共振多光子电离分析溅射中性子。3.溅射后速度分布随时间的变化”Jpn.J.Appl.Phys.30。

E.Kawatoh and R.Shimizu: "Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization III Change of the Velocity Distribution with Time After Sputtering" Jpn.J.Appl.Phys.

E.Kawatoh 和 R.Shimizu：“通过非共振多光子电离分析溅射中性子 III 溅射后速度分布随时间的变化”Jpn.J.Appl.Phys。

E. Kawatoh and R. Shimuzu: ""Analysis of Sputtered Neutrals by Nonresonant Multi-photon Ionization. I. Development of Laser Ion Counting System with a Simple Time-of-Flight Measurement"" Jpn. J. Appl. Phys.30. 608-611 (1991)

E. Kawatoh 和 R. Shimuzu：“通过非共振多光子电离分析溅射中性子。”