An in-situ study of the growth kinetics of pulsed laser deposition of multiferroic complex oxides and its influence on the properties of magnetoelectric coupling

多铁复合氧化物脉冲激光沉积生长动力学及其对磁电耦合性能影响的原位研究

• 批准号: 412136875
• 负责人: Professor Dr. Tilo Baumbach
• 金额: --
• 依托单位: Laboratorium für Elektronenmikroskopie (LEM)
• 依托单位国家: 德国
• 项目类别: Research Grants
• 财政年份: 2019
• 资助国家: 德国
• 起止时间: 2018-12-31 至 2022-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/412136875?language=en
• 关键词: situ; study; growth; kinetics; pulsed

The goal of the project is to gain fundamental understanding of the growth of complex oxides produced by pulsed laser deposition (PLD), thus enabling optimization of the growth parameters for fabrication of multiferroic oxide systems with high technological relevance.In this project we will experimentally determine the structure of the oxide films in dependence on the growth parameters and will study its influence on the magnetic and ferroelectric properties. The main task is to study the evolution of the crystalline film structure and interface properties of these materials in-situ during growth by applying most-advanced in-situ x-ray scattering methods with synchrotron radiation integrated into a unique in-situ PLD chamber, complemented by subsequent post-growth characterization by means of electron microscopy, scanning-probe microscopy and electric and magnetic measurements. In this way, we aim to gain deeper understanding of kinetic processes during growth, which may lead to single layers and multilayers with outstanding crystalline and interface quality resulting in improved multiferroic properties. The systems under study will comprise both homogeneous multiferroic systems (LuFeO3/Lu2FeO4) and multiferroic sandwiches (BaFe12O19 (BaM)/Ba0.5Sr0.5TiO3 (BSTO)), i.e. multilayers consisting of ferroelectric and (anti)-ferromagnetic components.To reach this goal, the project brings together German and Czech research groups with a strong background in theory, methods, and instrumentation for in-situ thin film growth and x-ray characterization, in transmission electron microscopy, and in their application to study growth kinetics and structure of thin films and nanostructures, complemented by a large magnetic laboratory for magnetometry studies.

该项目的目标是获得对脉冲激光沉积（PLD）产生的复杂氧化物生长的基本了解，从而能够优化具有高技术相关性的多铁氧化物系统制造的生长参数。在该项目中，我们将通过实验确定氧化膜的结构与生长参数的关系，并将研究其对磁性和铁电性能的影响。主要任务是通过应用最先进的原位 X 射线散射方法，并将同步加速器辐射集成到独特的原位 PLD 室中，研究这些材料在生长过程中原位晶体薄膜结构和界面特性的演变，并辅之以随后通过电子显微镜、扫描探针显微镜以及电磁测量进行的生长后表征。通过这种方式，我们的目标是更深入地了解生长过程中的动力学过程，这可能导致单层和多层具有出色的晶体和界面质量，从而改善多铁性。正在研究的系统将包括均质多铁性系统（LuFeO3/Lu2FeO4）和多铁性三明治（BaFe12O19（BaM）/Ba0.5Sr0.5TiO3（BSTO）），即由铁电和（反）铁磁成分组成的多层结构。该项目汇集了德国和捷克的研究小组，他们在原位薄膜生长的理论、方法和仪器方面拥有深厚的背景。 X 射线表征、透射电子显微镜及其用于研究薄膜和纳米结构的生长动力学和结构的应用，并辅以用于磁力测量研究的大型磁性实验室。