Formation of Functional Thin Films by a Double Plasma Device

双等离子体装置形成功能薄膜

基本信息

批准号：
62880003
负责人：
SUGAI Hideo
金额：
$ 2.24万
依托单位：
Nagoya University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Developmental Scientific Research
财政年份：
1987
资助国家：
日本
起止时间：
1987 至 1988
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-62880003/
关键词：
Thin Film Plasma Process Ion Beam Electron Beam Microwave Discharge Glow Discharge Double Plasma 反応性プラズマダブルプラズマ

项目摘要

We have proposed a new plasma processing technique called "double plasma method", where two independent plasmas are joined to form ion beams or electron beams. Energy distribution functions of charged particles in a reactive plasma can be controlled in the double plasma device by abjusting the external bias voltage between the two plasmas.In this project, we constructed a double plasma device using an ECR microwave discharge and a cold cathode glow discharge. The experimental results are summarized as follows:1. Production of high-energy ion beams an ion beam was extracted into a low-pressure microwave plasma from a cold-cathode glow discharge having a high plasma potential. The energy of the ion beam could be increased up to a value (600 eV) 2-3 times higher than the previous one.2. Production of electron beams with low energy and large area A low-energy (4-40 eV), large-area (16 cm diam.) electron beam was extracted from the microwave plasma into an externally biased chamber. The beam energy could be varied easily by abjusting the bias voltage, while the beam flux turned out to be limited by the ion loss rate in the microwave plasma.3. Investigation of behaviors of hydrogen radical the behaviors of hydrogen radical governing the film growth and properties were fundamentally investigated. New informations on a hydrogen molecule formation and a hydrogen absorption mechanism were obtained.

我们提出了一种称为“双等离子体法”的新等离子体处理技术，其中两个独立的等离子体结合形成离子束或电子束。通过调整两个等离子体之间的外部偏置电压，可以在双等离子体装置中控制反应等离子体中带电粒子的能量分布函数。在该项目中，我们利用ECR微波放电和冷阴极辉光放电构建了双等离子体装置。实验结果总结如下： 1．高能离子束的产生将离子束从具有高等离子体电势的冷阴极辉光放电提取到低压微波等离子体中。离子束的能量可以增加到比以前高2-3倍的值（600 eV）。2．低能量大面积电子束的产生低能量（4-40 eV）、大面积（直径16 cm）电子束从微波等离子体中提取到外部偏置室中。通过调节偏置电压可以很容易地改变束流能量，而束流通量却受到微波等离子体中离子损失率的限制。 3．氢自由基行为的研究从根本上研究了氢自由基控制薄膜生长和性能的行为。获得了关于氢分子形成和氢吸收机制的新信息。