プラズマを援用した単結晶ダイヤモンド基板の高能率ダメージフリー研磨法の開発

开发等离子体单晶金刚石基体高效无损伤抛光方法

• 批准号: 21J11028
• 负责人: LIU NIAN
• 金额: $ 0.96万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for JSPS Fellows
• 财政年份: 2021
• 资助国家: 日本
• 起止时间: 2021-04-28 至 2023-03-31
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-21J11028/
• 关键词: PAP; Single crystal diamond; Damage-free; Material removal rate; Isotropic removal; Anisotropic removal; Cathodoluminescence; Raman spectroscopy

A single crystal diamond (SCD) substrate is processed by plasma-assisted polishing (PAP) using four types of polishing plates, the quartz glass is the most suitable to obtain an atomically smooth surface with high material removal rate.As the polishing pressure applied to the SCD substrate varied, the isotropic chemical removal action was dominant when the PAP was performed at low polishing pressures such as 62.5 kPa, whereas the anisotropic mechanically induced removal action was dominant when the PAP was performed at high polishing pressures such as 350.0 kPa. In contrast, changing the sliding speed between the polishing plate and the SCD substrate did not affect the material removal mechanism of PAP.PAP was damage-free when applied to the polishing of SCD substrate.

单晶金刚石 (SCD) 基板使用四种类型的抛光板通过等离子体辅助抛光 (PAP) 进行加工，石英玻璃最适合获得具有高材料去除率的原子级光滑表面。当 SCD 基材变化时，当 PAP 在低抛光压力（如 ​​62.5 kPa）下进行时，各向同性化学去除作用占主导地位，而当 PAP 在高抛光压力（如）下进行时，各向异性机械诱导去除作用占主导地位。 350.0千帕。相比之下，改变抛光板与SCD基底之间的滑动速度并不会影响PAP的材料去除机制。PAP应用于SCD基底的抛光时不会受到损伤。

项目成果

Comparison of surface and subsurface damage of mosaic single-crystal diamond substrate processed by mechanical and plasma-assisted polishing

• DOI: 10.1016/j.diamond.2021.108555
• 发表时间: 2021-11
• 期刊: Diamond and Related Materials
• 影响因子: 4.1
• 作者: Nian Liu;Hideaki Yamada;Naoya Yoshitaka;Kenta Sugimoto;Rongyan Sun;K. Kawai;Kenta Arima;K. Yamamura

Effects of polishing pressure and sliding speed on the material removal mechanism of single crystal diamond in plasma-assisted polishing

等离子辅助抛光中抛光压力和滑动速度对单晶金刚石材料去除机理的影响

• DOI: 10.1016/j.diamond.2022.108899
• 发表时间: 2022
• 期刊: Diamond and Related Materials
• 影响因子: 4.1
• 作者: Liu Nian;Sugimoto Kentaro;Yoshitaka Naoya;Yamada Hideaki;Sun Rongyan;Kawai Kentaro;Arima Kenta;Yamamura Kazuya
• 通讯作者: Yamamura Kazuya