Collaborative Research: All-Optical Fabrication of Low-Loss, High-Index-Contrast, Silicon-in-Silicon Waveguides

合作研究：低损耗、高折射率对比度、硅中硅波导的全光学制造

• 批准号: 2128962
• 负责人: Shuting Lei
• 金额: $ 16.15万
• 依托单位: Kansas State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2021
• 资助国家: 美国
• 起止时间: 2021-09-15 至 2024-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2128962&HistoricalAwards=false
• 关键词: Collaborative; Research; Optical; Fabrication; Low

Title: All-optical fabrication of “silicon-in-silicon” waveguidesThe goal of this project is to develop a direct laser writing method to produce three-dimensional (3D) optical waveguides embedded inside silicon with low propagation loss. Although low-loss 3D waveguides have been demonstrated inside glass, the typical loss for waveguides written inside silicon so far is more than one order of magnitude higher. Two main challenges faced by the research team are insufficient energy deposition and random material change inside silicon, which are tackled through novel beam delivery and fundamental understanding of material response under intense laser irradiation. The direct laser writing method developed in this project simplifies fabrication procedures for silicon photonic devices, increases communication bandwidth, facilitates device miniaturization, and significantly enhances on-chip and chip-to-chip data processing capabilities. This method has the capability to be integrated with selective wet etching to fabricate microfluidic channels, enabling the integration of photonic, electronic and fluidic functionalities in a single chip. The team’s strong connection with local and national photonics industries enhances the societal impact of the project by expediting lab-to-fab transition with the proposed technology. The research is tightly integrated with education through undergraduate and graduate student training, classroom teaching modules, and K-12 outreach events for future workforce development. This grant supports basic research on laser-induced phase transformation in confined environment, with the goal to create low-loss, high-index-contrast, three-dimensional (3D) waveguides deep inside silicon (“Si-in-Si”). Current Si-in-Si waveguides have large loss and low contrast of refractive indices, making them unsuitable to be used in most photonics applications. The poor performance is due to micro- and nano-scale inhomogeneities consisting of mixed Si phases driven by local temperature in the laser focal region. In this project, femtosecond-nanosecond laser pulses will be used to achieve energy density required for the transition to amorphous and high-pressure phases. Modelling, simulation and experiments will be conducted to identify transition pathways leading to thermodynamically stable Si phases. A 3D splitter will be fabricated as a testing structure and its optical performance will be measured and compared with theory and simulation. This project will advance the understanding of (1) space-time confinement of ultrashort laser pulses in Si which exhibits high nonlinearity and strong two-photon absorption; (2) pressure-induced phase transition of Si, especially toward uncommon high-pressure phases; and (3) optical performance of waveguides with 3D architecture, such as bending radius and mode quality.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

标题：“硅中硅”波导的全光学制造该项目的目标是开发一种直接激光写入方法，用于嵌入硅内部的三维（3D）光波导，具有低传播损耗和低损耗 3D。虽然波导已在玻璃内部得到验证，但迄今为止，写入硅内部的波导的典型损耗要高出一个数量级以上，研究团队面临的两个主要挑战是硅内部能量沉积不足和材料随机变化。通过新颖的光束传输和对强激光照射下材料响应的基本了解来解决这个问题，该项目开发的直接激光写入方法简化了硅光子器件的制造程序，增加了通信带宽，促进了器件的小型化，并显着增强了片上和芯片的性能。该方法具有与选择性湿法蚀刻集成来制造微流体通道的能力，从而能够将光子、电子和流体功能集成在单个芯片中。该研究通过本科生和研究生培训、课堂教学模块和 K-12 推广活动与教育紧密结合，从而增强了该项目的社会影响。该拨款支持受限环境中激光诱导相变的基础研究，目标是在硅深处创建低损耗、高折射率对比度的三维 (3D) 波导（“Si-in”） -Si”）。目前的Si-in-Si波导具有较大的损耗和较低的折射率对比度，使其不适合在大多数光子学应用中使用，其性能较差是由于由局部温度驱动的混合Si相组成的微米级和纳米级不均匀性。在该项目中，将使用飞秒-纳秒激光脉冲来实现向非晶态和高压相转变所需的能量密度，并将进行建模、模拟和实验来确定转变路径。将制造出热力学稳定的硅相作为测试结构，并测量其光学性能并与理论和模拟进行比较，该项目将增进对 (1) 超短激光脉冲时空限制的理解。 Si 表现出高非线性和强双光子吸收；(2) Si 的压力诱导相变，特别是向不常见的高压相转变；(3) 具有 3D 结构的波导的光学性能，例如弯曲半径和该奖项反映了 NSF 的法定使命，并通过使用基金会的智力价值和更广泛的影响审查标准进行评估，被认为值得支持。