GOALI: Ultra-Low Wear Plasma Enhanced Atomic Layer Deposited Nitride Thin Films: Exploring Processing, Structure, Properties and Mechanisms

GOALI：超低磨损等离子体增强原子层沉积氮化物薄膜：探索加工、结构、性能和机制

• 批准号: 1826251
• 负责人: Nick Strandwitz
• 金额: $ 51.25万
• 依托单位: Lehigh University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2019
• 资助国家: 美国
• 起止时间: 2019-01-01 至 2023-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1826251&HistoricalAwards=false
• 关键词: GOALI; Ultra; Low; Wear; Plasma

Friction and wear of materials accounts for enormous losses in performance and lifetime of materials, devices and structures, at considerable cost to the US manufacturing, energy, and infrastructure sectors. Approaches to mitigate friction and wear are thus beneficial to the US economy. This Grant Opportunities for Academic Liaison with Industry (GOALI) award supports scientific research to understand mechanisms of friction and wear in metal nitride coatings. Preliminary studies revealed metal nitride coatings are among the most wear-resistant materials ever discovered, showing promise for significantly reducing the financial and environmental impacts of wear. In this research project, thin layers of metal nitride compounds are synthesized and their friction and wear properties are investigated. The aim of this work is to identify the relationships between how the films were created (processing) and their wear behavior (properties). Understanding these relationships allows for enhanced control of the mechanical behavior, and can lead to high-performance wear-resistant materials for coatings. The new materials developed are of broad importance for increasing efficiency and lifetime of mechanical systems, on both large and small scales. The work is performed in collaboration with an industrial partner, Veeco CNT. The industry team is integrally involved in the studies, which provides both educational opportunities for students involved in the research and a path to commercialization for high-performance wear-resistant coating materials. This research examines the fundamental relationships among processing, microstructure, and mechanical behavior in a class of transition metal nitrides deposited using plasma-enhanced atomic layer deposition. The high degree of synthetic tunability in this deposition technique allows for tailoring of the film composition and microstructure. Specifically, the fundamental role of composition on wear mechanism is investigated to determine the role of solid solution strengthening versus the formation of a lubricious wear-generated film in films with both vanadium and titanium cations. The impact of crystallite size on mechanical properties is determined for crystallite sizes in the 1-30 nm range using four independent synthesis parameters that control crystallite size. Adhesion and interface chemistry between the nitride films is investigated and related to macroscopic mechanical behavior, such as delamination, that is relevant to applications. Taken together, these studies reveal fundamental wear mechanisms of this highly promising material that can be related directly to the synthesis and processing parameters.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

材料的摩擦和磨损是材料，设备和结构的巨大损失，这对美国制造业，能源和基础设施部门付出了巨大的代价。因此，减轻摩擦和磨损的方法对美国经济有益。这种与工业联络的赠款机会（Goari）奖支持科学研究，以了解金属氮化金属涂料中的摩擦和磨损机制。初步研究表明，金属氮化金属涂料是有史以来发现的最防耐磨材料之一，有望大大降低磨损的财务和环境影响。在该研究项目中，合成了金属氮化物化合物的薄层，并研究了它们的摩擦和磨损特性。 这项工作的目的是确定电影的创作方式（处理）与其磨损行为（属性）之间的关系。 了解这些关系可以增强对机械行为的控制，并可能导致涂层的高性能耐磨材料。 开发的新材料对于提高大小规模的机械系统的效率和寿命至关重要。 这项工作是与工业合作伙伴Veeco CNT合作进行的。该行业团队积极参与研究，该研究为参与研究的学生提供了教育机会，也为高性能耐磨涂层材料提供了商业化的途径。这项研究研究了使用血浆增强原子层沉积沉积的一类过渡金属氮化物中的加工，微结构和机械行为之间的基本关系。在这种沉积技术中，高度的合成可调性允许量身定制膜组成和微观结构。 具体而言，研究了成分在磨损机制上的基本作用，以确定在具有钒和钛阳离子的薄膜中固定溶液加强与形成润滑性磨损产生膜的作用。使用四个控制结晶石大小的独立合成参数，确定了结晶石大小对机械性能的影响。研究了与应用相关的宏观机械行为（例如分层），研究了氮化物膜之间的粘附和界面化学。 综上所述，这些研究揭示了这种高度有前途的材料的基本磨损机制，这些机制可能直接与综合和处理参数有关。该奖项反映了NSF的法定任务，并被认为是值得通过基金会的知识分子优点和更广泛影响的评估来评估值得支持的。

项目成果

Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure

氮化钼钛的等离子体增强原子层沉积：射频偏压和衬底结构的影响

• DOI: 10.1116/6.0001175
• 发表时间: 2021
• 期刊: Journal of Vacuum Science & Technology A
• 影响因子: 2.9
• 作者: Chowdhury, Md. Istiaque;Sowa, Mark;Van Meter, Kylie E.;Babuska, Tomas F.;Grejtak, Tomas;Kozen, Alexander C.;Krick, Brandon A.;Strandwitz, Nicholas C.
• 通讯作者: Strandwitz, Nicholas C.

Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions

氮化钛-氮化钼固溶体的等离子体增强原子层沉积

• DOI: 10.1116/6.0000717
• 发表时间: 2021
• 期刊: Journal of Vacuum Science & Technology A
• 影响因子: 2.9
• 作者: Chowdhury, Md. Istiaque;Sowa, Mark;Kozen, Alexander C.;Krick, Brandon A.;Haik, Jewel;Babuska, Tomas F.;Strandwitz, Nicholas C.
• 通讯作者: Strandwitz, Nicholas C.

Plasma-enhanced atomic layer deposition of vanadium nitride

氮化钒的等离子体增强原子层沉积

• DOI: 10.1116/1.5109671
• 发表时间: 2019
• 期刊: Journal of Vacuum Science & Technology A
• 影响因子: 2.9
• 作者: Kozen, Alexander C.;Sowa, Mark J.;Ju, Ling;Strandwitz, Nicholas C.;Zeng, Guosong;Babuska, Tomas F.;Hsain, Zakaria;Krick, Brandon A.
• 通讯作者: Krick, Brandon A.

Quality Control Metrics to Assess MoS2 Sputtered Films for Tribological Applications

• DOI: 10.1007/s11249-022-01642-y
• 发表时间: 2022-12-01
• 期刊: TRIBOLOGY LETTERS
• 影响因子: 3.2
• 作者: Babuska, Tomas F.;Curry, John F.;Krick, Brandon A.
• 通讯作者: Krick, Brandon A.