GOALI: Collaborative Research: Interactions of Polishing and Incidental Nanoparticles in Chemical Mechanical Planarization Processes with Artificial Membranes and Human Cell Lines
GOALI:合作研究:化学机械平坦化过程中抛光和附带纳米颗粒与人造膜和人类细胞系的相互作用
基本信息
- 批准号:1604647
- 负责人:
- 金额:$ 19万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2016
- 资助国家:美国
- 起止时间:2016-08-01 至 2021-06-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
PI: Chen, Kai Loon#: 1605815COLLABORATIVEPI: Aravamudhan, Shyam #: 1604647Chemical Mechanical Planarization (CMP) is one of the important semiconductor manufacturing processes used in the production of advanced electronic devices such as computers, smart phones, and tablets. The CMP process uses huge volumes (millions of tons) of silica, ceria, or alumina particles in the form of abrasive slurries to planarize electronic circuits during the manufacturing process. However, environmental safety and health (ESH) impacts from the release of used CMP slurries containing nanoparticles into the natural environment and workplace exposure are largely unknown. The objective of this research is to study the ESH impacts and interactions of both pristine and used CMP nanoparticles with artificial cell membranes and human cell lines.Even though NPs are used in a large-scale in the CMP process during the manufacture of integrated circuits, little is known about their environmental and human health impacts, particularly the transformation of nanoparticles during the CMP process and their corresponding workplace exposure, fate, behavior, and toxicity. This is mainly due to the inability to obtain access to the transformed nanoparticle slurries from the CMP process. The main objectives of this project are to (1) systematically investigate, detect, and characterize the transformation of nanoparticle slurries during the CMP processes; (2) examine the influence of CMP and incidental nanoparticles to attach to and disrupt artificial cell membranes and their ability to affect human cell lines; and (3) determine the role of nanoparticle-membrane interactions on nanoparticle toxicity.This research has the potential to be transformative because a strong understanding of the biological interactions of pristine and transformed CMP NPs is not only relevant to the electronics industry, but also has wider applicability for a number of other nanoparticle applications, which routinely undergo life-cycle transformations through different physical and chemical processes. The research results will be disseminated through publications in peer-reviewed journals and student presentations at national scientific meetings. They will also be incorporated into undergraduate and graduate courses and community outreach programs, including K-12 scientific activities for an inner-city Baltimore elementary/middle school, NanoDay activities for the local community, NanoBus after-school program, and community college engagement. Lastly, the active involvement of an industrial partner will result in implementation of better engineering controls and safer CMP processes.
PI:Chen, Kai Loon#:1605815COLLABORATIVEPI:Aravamudhan,Shyam #:1604647 化学机械平坦化 (CMP) 是重要的半导体制造工艺之一,用于生产计算机、智能手机和平板电脑等先进电子设备。 CMP 工艺在制造过程中使用大量(数百万吨)磨料浆形式的二氧化硅、二氧化铈或氧化铝颗粒来平坦化电子电路。然而,含有纳米粒子的用过的 CMP 浆料释放到自然环境和工作场所暴露中对环境安全和健康 (ESH) 的影响在很大程度上尚不清楚。本研究的目的是研究原始和使用过的 CMP 纳米粒子对 ESH 的影响以及与人造细胞膜和人类细胞系的相互作用。尽管在集成电路制造过程中的 CMP 过程中大规模使用了 NP,人们对它们对环境和人类健康的影响知之甚少,特别是纳米颗粒在 CMP 过程中的转化及其相应的工作场所暴露、命运、行为和毒性。这主要是由于无法从 CMP 工艺获得转化的纳米颗粒浆料。该项目的主要目标是(1)系统地研究、检测和表征 CMP 过程中纳米颗粒浆料的转变; (2) 检查 CMP 和附带的纳米粒子对附着和破坏人造细胞膜的影响及其影响人类细胞系的能力; (3) 确定纳米颗粒-膜相互作用对纳米颗粒毒性的作用。这项研究具有变革性的潜力,因为对原始和转化的 CMP NP 的生物相互作用的深入了解不仅与电子行业相关,而且还具有对于许多其他纳米颗粒应用具有更广泛的适用性,这些应用通常通过不同的物理和化学过程经历生命周期转变。研究结果将通过同行评审期刊上的出版物和学生在国家科学会议上的演讲来传播。它们还将被纳入本科生和研究生课程以及社区外展计划,包括巴尔的摩市中心一所小学/中学的 K-12 科学活动、当地社区的 NanoDay 活动、NanoBus 课后计划和社区大学参与。最后,工业合作伙伴的积极参与将导致实施更好的工程控制和更安全的 CMP 工艺。
项目成果
期刊论文数量(1)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Acute and chronic toxicity to Daphnia magna of colloidal silica nanoparticles in a chemical mechanical planarization slurry after polishing a gallium arsenide wafer
- DOI:10.1016/j.impact.2018.12.004
- 发表时间:2019
- 期刊:
- 影响因子:4.9
- 作者:S. Karimi;Meiline Troeung;Ruhung Wang;R. Draper;P. Pantano;S. Crawford;S. Aravamudhan
- 通讯作者:S. Karimi;Meiline Troeung;Ruhung Wang;R. Draper;P. Pantano;S. Crawford;S. Aravamudhan
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Shyam Aravamudhan其他文献
3D Printing of Parametrically Designed Microfluidic Molds
参数化设计微流体模具的 3D 打印
- DOI:
- 发表时间:
2022 - 期刊:
- 影响因子:0
- 作者:
Muhammad Hassan Raza;Shyam Aravamudhan;Reza Zadegan - 通讯作者:
Reza Zadegan
Evaluating Stresses in SiO2 Thin Films Using Molecular Dynamics Simulations
使用分子动力学模拟评估 SiO2 薄膜中的应力
- DOI:
10.3390/asec2023-16369 - 发表时间:
2023 - 期刊:
- 影响因子:0
- 作者:
S. Shendokar;Nikhil Ingle;Ram Mohan;Shyam Aravamudhan - 通讯作者:
Shyam Aravamudhan
Generative AI-Based Data Analysis for Evaluation of Variations in XPS Characteristics of MoS2
基于生成人工智能的数据分析,用于评估 MoS2 XPS 特性的变化
- DOI:
- 发表时间:
2023 - 期刊:
- 影响因子:0
- 作者:
S. Shendokar;Nagesh Raykar;Ajinkya Bankar;Shyam Aravamudhan - 通讯作者:
Shyam Aravamudhan
Shyam Aravamudhan的其他文献
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{{ truncateString('Shyam Aravamudhan', 18)}}的其他基金
MRI: Acquisition of an X-ray Diffractometer (XRD) for Multidisciplinary Materials Research and Education
MRI:购买 X 射线衍射仪 (XRD) 用于多学科材料研究和教育
- 批准号:
2117811 - 财政年份:2021
- 资助金额:
$ 19万 - 项目类别:
Standard Grant
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