MRI: Acquisition of a Direct-Write Laser System for Innovations in Electronic & Photonic Device Design

MRI：获取直写激光系统以实现电子创新

• 批准号: 1531320
• 负责人: Karl Hirschman
• 金额: $ 34.5万
• 依托单位: Rochester Institute of Tech
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2015
• 资助国家: 美国
• 起止时间: 2015-09-01 至 2017-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1531320&HistoricalAwards=false
• 关键词: MRI; Acquisition; Direct; Write; Laser

A direct-write laser (DWL) is a system used to pattern fine features without the need for a photomask or reticle. This proposal requests funds for the acquisition of a DWL system for innovations in electronic and photonic device design that will be used for a variety of research applications at RIT. The DWL system will positively impact the quality and productivity of research in several projects that are currently funded by NSF, as well as other agencies and industrial partners. There are several application areas under investigation including thin-film electronics, nanophotonics & micro-optics, III-V / silicon integration, photovoltaics, MEMS, microchannels & 3D integration; each of which will utilize specific advantages and capabilities of the DWL system. Participants will include undergraduates and graduate students in several programs at RIT, including PhD programs in Microsystems Engineering and Imaging Science. The DWL system will also be a resource for laboratory courses in photolithography, thin-film processes, and microfabrication which provide research training to students that feed into the graduate programs. The DWL system will be housed in a user facility which promotes collaborative multidisciplinary research. A number of undergraduate and graduate students majoring in science and engineering will use this instrument for research including capstone senior design projects, MS and PhD theses. The laboratory courses impacted are available as elective courses to all undergraduate and graduate students in engineering and science, and may count towards a 5-course minor in microfabrication. This broadens the student base that gains experience with the DWL system and will help to further increase the number of students that are retained for graduate study and participate in research activities. Results from the DWL system will provide a significant contribution to the literature in relevant and emerging scientific fields.A DWL system fills an important niche in R&D for pattern optimization prior to committing to a fixed photomask design. Depending on the laser source wavelength and optical design, a DWL system offers resolution comparable to projection optical lithography. There are several advantages that a DWL system has over traditional proximity or projection optical lithography that makes it an attractive alternative including the ability to handle a variety of substrate shapes and sizes, make on-demand pattern changes, and implement pattern variations within a sample. These advantages support a significant increase in the efficiency of experimental design. Exposure levels using a DWL system with fine pattern alignment can be intermixed with e-beam or traditional optical lithography levels, providing design flexibility on several levels of pattern transfer in a process sequence. The DWL system will also provide capabilities in backside alignment and grayscale imaging, offering researchers new options in microfabrication which are generally not outsourced due to the associated engineering required for implementation.

直写激光器 (DWL) 是一种无需光掩模或掩模版即可对精细特征进行图案化的系统。 该提案请求资金购买 DWL 系统，以实现电子和光子器件设计的创新，该系统将用于 RIT 的各种研究应用。 DWL 系统将对目前由 NSF 以及其他机构和工业合作伙伴资助的多个项目的研究质量和生产力产生积极影响。 目前正在研究多个应用领域，包括薄膜电子学、纳米光子学和微光学、III-V族/硅集成、光伏、MEMS、微通道和3D集成；其中每一个都将利用 DWL 系统的特定优势和功能。 参与者将包括 RIT 多个项目的本科生和研究生，其中包括微系统工程和成像科学的博士项目。 DWL 系统还将成为光刻、薄膜工艺和微加工实验室课程的资源，为研究生课程的学生提供研究培训。 DWL 系统将安装在促进多学科协作研究的用户设施中。 许多科学与工程专业的本科生和研究生将使用该仪器进行研究，包括顶点高级设计项目、硕士和博士论文。 受影响的实验室课程可作为工程和科学领域所有本科生和研究生的选修课程，并可计入微加工方面的 5 门辅修课程。 这扩大了获得 DWL 系统经验的学生基础，并将有助于进一步增加保留研究生学习和参与研究活动的学生数量。 DWL 系统的结果将为相关和新兴科学领域的文献做出重大贡献。DWL 系统在致力于固定光掩模设计之前，在图案优化的研发中填补了一个重要的空白。 根据激光源波长和光学设计，DWL 系统可提供与投影光学光刻相当的分辨率。 与传统的接近式或投影光学光刻相比，DWL 系统具有多个优点，使其成为有吸引力的替代方案，包括能够处理各种基板形状和尺寸、按需进行图案变化以及在样品内实现图案变化。 这些优势支持显着提高实验设计的效率。 使用具有精细图案对准功能的 DWL 系统的曝光级别可以与电子束或传统光学光刻级别混合，从而为工艺序列中的多个图案转移级别提供设计灵活性。 DWL 系统还将提供背面对准和灰度成像功能，为研究人员提供微加工的新选择，由于实施所需的相关工程，这些选择通常不会外包。