MRI: Acquisition of a Direct-Write Laser System for Innovations in Electronic & Photonic Device Design

MRI：获取直写激光系统以实现电子创新

• 批准号: 1531320
• 负责人: Karl Hirschman
• 金额: $ 34.5万
• 依托单位: Rochester Institute of Tech
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2015
• 资助国家: 美国
• 起止时间: 2015-09-01 至 2017-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1531320&HistoricalAwards=false
• 关键词: MRI; Acquisition; Direct; Write; Laser; MRI; Acquisition; Direct; Write; Laser

A direct-write laser (DWL) is a system used to pattern fine features without the need for a photomask or reticle. This proposal requests funds for the acquisition of a DWL system for innovations in electronic and photonic device design that will be used for a variety of research applications at RIT. The DWL system will positively impact the quality and productivity of research in several projects that are currently funded by NSF, as well as other agencies and industrial partners. There are several application areas under investigation including thin-film electronics, nanophotonics & micro-optics, III-V / silicon integration, photovoltaics, MEMS, microchannels & 3D integration; each of which will utilize specific advantages and capabilities of the DWL system. Participants will include undergraduates and graduate students in several programs at RIT, including PhD programs in Microsystems Engineering and Imaging Science. The DWL system will also be a resource for laboratory courses in photolithography, thin-film processes, and microfabrication which provide research training to students that feed into the graduate programs. The DWL system will be housed in a user facility which promotes collaborative multidisciplinary research. A number of undergraduate and graduate students majoring in science and engineering will use this instrument for research including capstone senior design projects, MS and PhD theses. The laboratory courses impacted are available as elective courses to all undergraduate and graduate students in engineering and science, and may count towards a 5-course minor in microfabrication. This broadens the student base that gains experience with the DWL system and will help to further increase the number of students that are retained for graduate study and participate in research activities. Results from the DWL system will provide a significant contribution to the literature in relevant and emerging scientific fields.A DWL system fills an important niche in R&D for pattern optimization prior to committing to a fixed photomask design. Depending on the laser source wavelength and optical design, a DWL system offers resolution comparable to projection optical lithography. There are several advantages that a DWL system has over traditional proximity or projection optical lithography that makes it an attractive alternative including the ability to handle a variety of substrate shapes and sizes, make on-demand pattern changes, and implement pattern variations within a sample. These advantages support a significant increase in the efficiency of experimental design. Exposure levels using a DWL system with fine pattern alignment can be intermixed with e-beam or traditional optical lithography levels, providing design flexibility on several levels of pattern transfer in a process sequence. The DWL system will also provide capabilities in backside alignment and grayscale imaging, offering researchers new options in microfabrication which are generally not outsourced due to the associated engineering required for implementation.

直接连续激光器（DWL）是一种用于对精细特征进行图案的系统，而无需拍照或标线。 该提案要求资金获得电子和光子设备设计创新的DWL系统，该系统将用于RIT的各种研究应用程序。 DWL系统将对目前由NSF以及其他机构和工业合作伙伴资助的几个项目中的研究质量和生产力产生积极影响。 正在研究的几个应用领域，包括薄膜电子设备，纳米粒子和微观磁化，III-V /硅整合，光伏，MEMS，微通道和3D集成；每种都将利用DWL系统的特定优势和功能。 参与者将在RIT的多个课程中包括本科生和研究生，包括Microsystems工程和成像科学领域的博士学位课程。 DWL系统还将成为光刻，薄膜过程和微加工的实验室课程的资源，可为为研究生课程提供的学生提供研究培训。 DWL系统将安置在用户设施中，以促进协作多学科研究。 许多科学和工程专业的本科生和研究生将使用此工具进行研究，包括Capstone高级设计项目，MS和PhD论文。 所影响的实验室课程可作为所有工程和科学的本科生和研究生的选修课程，并且可能会算作微型制动的5道菜未成年人。 这扩大了获得DWL系统经验的学生基础，并将有助于进一步增加保留研究生学习并参与研究活动的学生人数。 DWL系统的结果将为相关和新兴的科学领域的文献提供重要贡献。ADWL系统填充了研发中的重要利基，以进行模式优化，然后再进行固定的光掩模设计。 根据激光源波长和光学设计，DWL系统提供的分辨率与投影光刻相当。 DWL系统比传统的接近或投影光刻具有多种优点，这使其成为有吸引力的替代方案，包括处理各种底物形状和尺寸，进行按需模式变化以及在样本中实现模式变化。 这些优势支持实验设计效率的显着提高。 使用具有良好图案对齐的DWL系统的曝光水平可以与电子束或传统光刻水平级别混合，从而在过程序列中为多个级别的模式传输提供了设计灵活性。 DWL系统还将在背面对齐和灰度成像中提供功能，从而为研究人员提供新的微加工方案，这些选择通常由于实施所需的相关工程而不会外包。