Ion Sculpting of Multilayer Gratings for Extreme Ultraviolet Applications

用于极紫外应用的多层光栅的离子雕刻

• 批准号: 1508745
• 负责人: Carmen Menoni
• 金额: $ 50万
• 依托单位: Colorado State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2015
• 资助国家: 美国
• 起止时间: 2015-07-01 至 2019-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1508745&HistoricalAwards=false
• 关键词: Ion; Sculpting; Multilayer; Gratings; Extreme

This project is jointly funded by the Electronic and Photonic Materials Program (EPM) in the Division of Materials Research (DMR), and by the Electronics, Photonics, and Magnetic Devices Program (EPMD) in the Division of Electrical, Communications and Cyber Systems (ECCS). Nontechnical Description: With wavelengths of tens of nanometers, bright beams of extreme ultraviolet and soft x-ray light in combination with specialized optics are enabling applications such as nano-imaging and the lithography of advanced semiconductor chips. Extreme ultraviolet and soft x-ray applications require optical components, such as mirrors, lenses, and gratings, capable of guiding, focusing, and dispersing or filtering the light, respectively. There are, however, enormous challenges in the engineering of these optical components, from both the materials and design standpoints. In this project, directed ion beams interacting with the sample's surface create periodic patterns with a sawtooth form. By depositing stacks of nanometer-thick metal layers on these surfaces, it is possible to significantly enhance the efficiency of the multilayers and to produce advanced optics such as blazed diffraction gratings. Such gratings can generate highly directional beams that are necessary in important applications such as interference imaging, resonant inelastic x-ray scattering, and spectroscopy. This exciting new line of research offers ample opportunities for graduate and undergraduate students to work on a cutting-edge scientific and technological problem in a truly interdisciplinary environment. The breath of the outreach efforts of this project ensures participation of a diverse group of students at all levels.Technical Description: "Ion sculpting," i.e., bombarding a solid with a broad ion beam, can produce a remarkable variety of self-assembled nanoscale patterns on a solid surface. This project combines experiments and theoretical investigations with the goal of demonstrating a novel "ion sculpting" method to fabricate multilayer blazed gratings. This method has the potential to produce gratings of unprecedented efficiency for use at extreme ultraviolet and soft x-ray wavelengths. The project encompasses fundamental research aimed at understanding the interaction of highly directional ion beams with surfaces through experiments and modeling. The theoretical work facilitates the optimization of the ion-sculpting process and guides the experiments. State-of-the-art deposition equipment and at-wavelength metrology provide the infrastructure to fabricate and test the multilayer metal-dielectric gratings.

该项目由材料研究部（DMR）的电子和光子材料计划（EPM）以及电气、通信和网络系统部的电子、光子和磁性器件计划（EPMD）共同资助（电子控制系统）。非技术描述：波长为数十纳米、明亮的极紫外光和软 X 射线光束与专用光学器件相结合，可实现纳米成像和先进半导体芯片光刻等应用。极紫外和软 X 射线应用需要能够分别引导、聚焦、色散或过滤光的光学元件，例如镜子、透镜和光栅。然而，从材料和设计的角度来看，这些光学元件的工程设计都面临着巨大的挑战。在该项目中，定向离子束与样品表面相互作用，产生锯齿形式的周期性图案。通过在这些表面上沉积纳米厚的金属层堆叠，可以显着提高多层的效率并生产先进的光学器件，例如闪耀衍射光栅。这种光栅可以产生高度定向的光束，这在干涉成像、共振非弹性 X 射线散射和光谱学等重要应用中是必需的。这一令人兴奋的新研究领域为研究生和本科生提供了充足的机会，让他们在真正的跨学科环境中研究尖端科学和技术问题。该项目的推广工作确保了各个级别的不同学生群体的参与。技术描述：“离子雕刻”，即用宽离子束轰击固体，可以产生各种各样的自组装纳米级材料固体表面上的图案。该项目将实验和理论研究结合起来，目的是展示一种新颖的“离子雕刻”方法来制造多层闪耀光栅。这种方法有可能生产出效率空前的光栅，用于极紫外和软 X 射线波长。该项目包括基础研究，旨在通过实验和建模了解高度定向离子束与表面的相互作用。理论工作有助于离子雕刻过程的优化并指导实验。最先进的沉积设备和波长计量学为制造和测试多层金属电介质光栅提供了基础设施。