VERY LARGE SCALE INTEGRATED MEMS FOR MASSIVELY PARALLEL SCANNING PROBE NANOLITHOGRAPHY

用于大规模并行扫描探针纳米光刻的超大规模集成MEMS

• 批准号: 1344047
• 负责人: Siavash Pourkamali Anaraki
• 金额: $ 15.95万
• 依托单位: University of Texas at Dallas
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2013
• 资助国家: 美国
• 起止时间: 2013-05-24 至 2015-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1344047&HistoricalAwards=false
• 关键词: VERY; LARGE; SCALE; INTEGRATED; MEMS

1028710-VERY LARGE SCALE INTEGRATED MEMS FOR MASSIVELY PARALLEL SCANNING PROBE NANOLITHOGRAPHYThe objective of this research is to develop an enabling technology for low-cost high through-put parallel scanning probe nanolithography using micro-engineered electromechanical systems. The proposed systems include 2-dimensional arrays of nanoscale probe tips integrated on micro-actuators with nano-precision positioning capability in horizontal directions. An autonomous feedback mechanism integrated along with each probe provides an interactive real time control in the vertical direction to maintain a high level of uniformity between different probes.Intellectual Merit: Lithography at the nanometer scale is the key step in manufacturing of next generation electronic and electromechanical components. Currently available probe-based high-precision nanolithography techniques are based on serial processing (direct writing) suffering from long processing time and cost-inefficiency for industrial applications. Most of the efforts to reach higher through-put using arrays of probes operating in parallel focus on the capability to address probes individually requiring extensive electrical connections, while the main issue of uniformity between different probes has not been adequately addressed. The proposed technology will lead to systems capable of generating a large number of similar nanoscale patterns in parallel with great uniformity. Broader Impact: This project contributes to development of powerful nanolithography tools for low-cost high through-put nano-manufacturing, as well as maskless micro and nanolithography for academic and R&D environments. The training and involvement of graduate and undergraduate students in the research activities enables them to join the next generation micro/nano-engineering workforce. Special efforts will be taken to encourage the participation of students from underrepresented groups.

1028710-非常大规模的集成MEMS，用于大规模并行扫描探针纳米版术，这项研究的目的是为使用微工程机电系统的低成本高成本的高成本平行扫描探针纳米印刷开发一种启示技术。所提出的系统包括在水平方向上集成在具有纳米精度定位能力的微型演员上的纳米级探针尖端的二维阵列。与每个探针一起集成的自主反馈机制在垂直方向上提供了一个交互式的实时控制，以保持不同的探针之间的高度均匀性。IntlectualCreet：在纳米尺度上的光刻是制造下一代电子和机电组件的关键步骤。目前可用的基于探针的高精度纳米光刻技术基于串行处理（直接写作），遭受了长期处理时间和工业应用的成本信息。大多数努力使用以下探针阵列以单独解决需要广泛的电气连接的探针的能力进行的大多数努力，而不同探针之间的主要均匀性问题尚未得到充分解决。拟议的技术将导致能够与均匀性并行生成大量类似的纳米级模式的系统。更广泛的影响：该项目有助于开发强大的纳米光刻工具，用于低成本高成本的纳米制造，以及用于学术和研发环境的无面罩的微观和纳米光刻。研究生和本科生参与研究活动的培训和参与使他们能够加入下一代微型/纳米工程劳动力。将采取特殊努力来鼓励来自代表性不足的团体的学生参与。